{"paper":{"title":"The Dependence of Alloy Composition of InGaAs Inserts in GaAs Nanopillars on Selective-Area Pattern Geometry","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":[],"primary_cat":"cond-mat.mtrl-sci","authors_text":"Adam C. Scofield, Andrew Lin, Diana L. Huffaker, Giacomo Mariani, Joshua Shapiro, Nicholas Benzoni","submitted_at":"2013-05-15T18:35:37Z","abstract_excerpt":"GaAs nanopillars with 150 nm - 200 nm long axial InGaAs inserts are grown by MOCVD via catalyst-free selective-area-epitaxy (SAE). The alloy composition of the InGaAs region, as determined by room-temperature photoluminescence (PL), depends critically on the pitch and diameter of the selective-area pattern geometry. The PL emission varies based on pattern geometry from 1.0 \\{mu}m to 1.25 \\{mu}m corresponding to a In to Ga ratio from 0.15 to > 0.3. This In enrichment is explained by a pattern dependent change in the incorporation rate for In and Ga. Capture coefficients for Ga and In adatoms ar"},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1305.3581","kind":"arxiv","version":1},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"}