{"paper":{"title":"Third generation residual gas ionization profile monitors at Fermilab","license":"http://creativecommons.org/licenses/by/3.0/","headline":"","cross_cats":["physics.ins-det"],"primary_cat":"physics.acc-ph","authors_text":"B. Fellenz, C. Jensen, C. Lundberg, D. Slimmer, D. Tinsley (Fermilab), E. McCrory, J.R. Zagel, M. Alvarez, R. Thurman-Keup","submitted_at":"2015-02-09T21:52:58Z","abstract_excerpt":"The latest generation of IPMs installed in the Fermilab Main Injector and Recycler incorporate a 1 kG permanent magnet, a newly designed high-gain, rad-tolerant preamp, and a control grid to moderate the charge that is allowed to arrive on the anode pick-up strips. The control grid is intended to select a single Booster batch measurement per turn. Initially it is being used to allow for a faster turn-on of a single, high-intensity cycle in either machine. The expectation is that this will extend the Micro Channel Plate lifetime, which is the high-cost consumable in the measurement system. We d"},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1502.02703","kind":"arxiv","version":1},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"}