{"paper":{"title":"Characterization of the second- and third-order nonlinear optical susceptibilities of monolayer MoS$_2$ using multiphoton microscopy","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":["physics.optics"],"primary_cat":"cond-mat.mes-hall","authors_text":"C. F. Phelan, C. J. S. de Matos, E. C. de Oliveira, E. J. R. Kelleher, G. Eda, G. J. M. Fechine, R. E. P. de Oliveira, R. I. Woodward, R. T. Murray, S. Li, T. H. Runcorn","submitted_at":"2016-06-26T22:23:00Z","abstract_excerpt":"We report second- and third-harmonic generation in monolayer MoS$_\\mathrm{2}$ as a tool for imaging and accurately characterizing the material's nonlinear optical properties under 1560 nm excitation. Using a surface nonlinear optics treatment, we derive expressions relating experimental measurements to second- and third-order nonlinear sheet susceptibility magnitudes, obtaining values of $|\\chi_s^{(2)}|=2.0\\times10^{-20}$ m$^2$ V$^{-1}$ and for the first time for monolayer MoS$_\\mathrm{2}$, $|\\chi_s^{(3)}|=1.7\\times10^{-28}$ m$^3$ V$^{-2}$. These sheet susceptibilities correspond to effective "},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1606.08093","kind":"arxiv","version":2},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"}