{"paper":{"title":"Enhanced low-flux sensitivity (ELFS) effect of neutron-induced displacement damage in bipolar devices: physical mechanism and parametric model","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":["physics.app-ph"],"primary_cat":"physics.space-ph","authors_text":"Chunsheng Jiang, Mu Lan, Yang Liu, Ying Zhang, Yu Song","submitted_at":"2019-07-02T14:37:38Z","abstract_excerpt":"Similar to the enhanced low-dose-rate sensitivity (ELDRS) effect of ionization damage, an enhanced low-flux senstivity (ELFS) effect has been reported in ions/neutron irradiation on n-type silicon or PNP transistors. However, the existing mechanism and simulation dominated by the diffusion dynamics give much higher transition flux than the experimental observations. In this work, we develop a new model based on the annealing of defect clusters for the ELFS effect. Simulations considering Si-interstitial-mediated inter-cluster interactions during their annealing processes successfully reproduce"},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1907.01408","kind":"arxiv","version":1},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"}