{"paper":{"title":"Muonium emission into vacuum from mesoporous thin films at cryogenic temperatures","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":["hep-ex"],"primary_cat":"physics.atom-ph","authors_text":"A. Antognini, A. Suter, B. Barbiellini, E. Morenzoni, F. M. Piegsa, K. Kirch, K. Kwuida, K. S. Khaw, L. Liszkay, P. Crivelli, T. Prokscha, Z. Salman","submitted_at":"2011-12-20T23:43:58Z","abstract_excerpt":"We report on Muonium (Mu) emission into vacuum following {\\mu}+ implantation in mesoporous thin SiO2 films. We obtain a yield of Mu into vacuum of (38\\pm4)% at 250 K temperature and (20\\pm4)% at 100 K for 5 keV {\\mu}+ implantation energy. From the implantation energy dependence of the Mu vacuum yield we determine the Mu diffusion constants in these films: D250KMu = (1.6 \\pm 0.1) \\times 10-4 cm2/s and D100KMu = (4.2\\pm0.5)\\times10-5 cm2/s. Describing the diffusion process as quantum mechanical tunneling from pore-to-pore, we reproduce the measured temperature dependence T^3/2 of the diffusion c"},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1112.4887","kind":"arxiv","version":1},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"}