{"paper":{"title":"Enhancing ordering dynamics in solvent-annealed block-copolymer films by lithographic hard masks supports","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":[],"primary_cat":"cond-mat.soft","authors_text":"Alexander B\\\"oker, Anja Stenbock-Fermor, Armin W. Knoll, Larisa Tsarkova","submitted_at":"2014-05-13T08:31:07Z","abstract_excerpt":"We studied solvent-driven ordering dynamics of block copolymer films supported by a densely cross-linked polymer network designed as organic hard mask (HM) for lithographic fabrications. The ordering of microphase separated domains at low degrees of swelling corresponding to intermediate/strong segregation regimes was found to proceed significantly faster in films on a HM layer as compared to similar block copolymer films on silicon wafers. The ten-fold enhancement of the chain mobility was evident in the dynamics of morphological phase transitions and of related process of terrace-formation o"},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1405.3065","kind":"arxiv","version":1},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"}