{"paper":{"title":"Direct-write electrochemical nanofabrication of ultrasmall graphene devices","license":"http://creativecommons.org/licenses/by/4.0/","headline":"Electrochemical AFM lithography fabricates sub-10 nm graphene nanoribbon FETs without electrodes.","cross_cats":["cond-mat.mtrl-sci"],"primary_cat":"cond-mat.mes-hall","authors_text":"Colm Durkan, Xiao Liu","submitted_at":"2026-05-12T19:06:50Z","abstract_excerpt":"Graphene nano-ribbons, GNRs, are promising channel materials for next-generation ultra-miniaturised devices due to their exceptional electrical and thermal properties which arise from their atomic thickness, as well as their ability to have a size-dependent band-gap [1-9]. However, despite extensive efforts to reliably fabricate narrow GNR-based field-effect transistors [10-12], their integration into conventional transistor technologies remains hindered by challenges such as high fabrication costs and complex processing requirements [13, 14]. In this study, we present a direct-write, relative"},"claims":{"count":4,"items":[{"kind":"strongest_claim","text":"we present a direct-write, relatively low-cost and robust approach for fabricating sub-10 nm GNR-based FETs using electrochemical atomic force microscopy lithography with an alternating current (AC) bias, obviating the need for electrodes.","source":"verdict.strongest_claim","status":"machine_extracted","claim_id":"C1","attestation":"unclaimed"},{"kind":"weakest_assumption","text":"The assumption that the electrochemical process with AC bias can reliably produce functional sub-10 nm GNR FETs with the claimed low defect density and high resolution without the need for electrodes, as no specific performance data is detailed in the abstract.","source":"verdict.weakest_assumption","status":"machine_extracted","claim_id":"C2","attestation":"unclaimed"},{"kind":"one_line_summary","text":"Direct electrochemical AFM lithography fabricates sub-10 nm GNR FETs electrode-free with high resolution and low defects.","source":"verdict.one_line_summary","status":"machine_extracted","claim_id":"C3","attestation":"unclaimed"},{"kind":"headline","text":"Electrochemical AFM lithography fabricates sub-10 nm graphene nanoribbon FETs without electrodes.","source":"verdict.pith_extraction.headline","status":"machine_extracted","claim_id":"C4","attestation":"unclaimed"}],"snapshot_sha256":"c26b89d110b1a2527a8f88a902f5c448bcbe4a8e875777a72ad83c6853d838fe"},"source":{"id":"2605.12660","kind":"arxiv","version":1},"verdict":{"id":"8ce130c1-2f4c-432b-9dd6-4b64767e407d","model_set":{"reader":"grok-4.3"},"created_at":"2026-05-14T20:02:29.467140Z","strongest_claim":"we present a direct-write, relatively low-cost and robust approach for fabricating sub-10 nm GNR-based FETs using electrochemical atomic force microscopy lithography with an alternating current (AC) bias, obviating the need for electrodes.","one_line_summary":"Direct electrochemical AFM lithography fabricates sub-10 nm GNR FETs electrode-free with high resolution and low defects.","pipeline_version":"pith-pipeline@v0.9.0","weakest_assumption":"The assumption that the electrochemical process with AC bias can reliably produce functional sub-10 nm GNR FETs with the claimed low defect density and high resolution without the need for electrodes, as no specific performance data is detailed in the abstract.","pith_extraction_headline":"Electrochemical AFM lithography fabricates sub-10 nm graphene nanoribbon FETs without electrodes."},"references":{"count":2,"sample":[{"doi":"","year":2011,"title":"International Roadmap for Devices and Systems (IRDS)","work_id":"5a2e6baa-e0bb-4911-b2d0-ed00188d0ecf","ref_index":1,"cited_arxiv_id":"","is_internal_anchor":false},{"doi":"","year":2012,"title":"#(%&\"#)[%)(*&%)","work_id":"f001eb92-4945-452e-9b33-fa9c7183abda","ref_index":2,"cited_arxiv_id":"","is_internal_anchor":false}],"resolved_work":2,"snapshot_sha256":"58e7f4d85e0d400a774939e80f70b2aa02a7baffcd7b7694481d4d69a8175630","internal_anchors":0},"formal_canon":{"evidence_count":2,"snapshot_sha256":"57538b18cc0fb9f538751893afec6e81da06d8cc9cc1fc8d1bbae5373bc13021"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"}