{"paper":{"title":"Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions","license":"http://creativecommons.org/licenses/by/4.0/","headline":"","cross_cats":["cond-mat.mtrl-sci"],"primary_cat":"physics.plasm-ph","authors_text":"Kazuhiro Karahashi, Satoshi Hamaguchi, Tomoko Ito","submitted_at":"2026-08-08T09:38:32Z","abstract_excerpt":"Etching yields of Si, SiO2, and Si3N4 have been determined for silicon ion (Si+), halogen ions (F+, Cl+, and Br+) and silicon halide ions (SiF+, SiF3+, SiCl+, SiCl3+, SiBr+, and SiBr3+) irradiation in 300 to 1000 eV using a mass-selected ion beam apparatus that can irradiate a single species ion to sample surfaces under an ultra-high vacuum condition. Si+ irradiation below 1000eV deposits silicon atoms on Si, SiO2, and Si3N4 surfaces. The etching yields of silicon tri-halide ions (SiF3+, SiCl3+, and SiBr3+) above 1000 eV are larger than those of halogen ions, respectively, and these etching yi"},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"2608.08031","kind":"arxiv","version":1},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"integrity":{"clean":true,"summary":{"advisory":0,"critical":0,"by_detector":{},"informational":0},"endpoint":"/pith/2608.08031/integrity.json","findings":[],"available":true,"detectors_run":[],"snapshot_sha256":"c28c3603d3b5d939e8dc4c7e95fa8dfce3d595e45f758748cecf8e644a296938"},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"}