{"paper":{"title":"Catalytic precursor dissociation in Hot-Wire CVD and comparing a-Si:H growth under continuous and pulsed silane flow conditions","license":"http://creativecommons.org/licenses/by-nc-nd/4.0/","headline":"","cross_cats":[],"primary_cat":"cond-mat.mtrl-sci","authors_text":"Karam Veer Singh, Rajiv O. Dusane, Swati Goyal, Triratna P. Muneshwar","submitted_at":"2026-05-30T16:09:10Z","abstract_excerpt":"Hot-wire Chemical vapor deposition (HWCVD) of hydrogenated amorphous silicon (a-Si:H) thin films utilizes the dissociation of silane (SiH4) precursor over heated tungsten or tantalum filaments (\\geq 1600 {\\deg}C). In this work, assuming catalytic dissociation mechanism, we present kinetic model for SiH4 dissociation and the resulting a-Si:H film growth. Our model calculations showed that for an identical dose of the introduced SiH4 precursor, a-Si:H thickness was considerably higher for the pulsed SiH4 flow as compared to the continuous SiH4 flow. The pulsed SiH4 flow is represented by time in"},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"2606.00788","kind":"arxiv","version":1},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"integrity":{"clean":true,"summary":{"advisory":0,"critical":0,"by_detector":{},"informational":0},"endpoint":"/pith/2606.00788/integrity.json","findings":[],"available":true,"detectors_run":[],"snapshot_sha256":"c28c3603d3b5d939e8dc4c7e95fa8dfce3d595e45f758748cecf8e644a296938"},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"}