{"paper":{"title":"Cost Modeling and Projection for Stacked Nanowire Fabric","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":["cs.AR"],"primary_cat":"cs.ET","authors_text":"Mostafizur Rahman, Naveen Kumar Macha","submitted_at":"2017-09-06T19:04:46Z","abstract_excerpt":"To continue scaling beyond 2-D CMOS with 3-D integration, any new 3-D IC technology has to be comparable or better than 2-D CMOS in terms of scalability, enhanced functionality, density, power, performance, cost, and reliability. Transistor-level 3-D integration carries the most potential in this regard. Recently, we proposed a stacked horizontal nanowire based transistor-level 3-D integration approach, called SN3D [1][2] that solves scaling challenges and achieves tremendous benefits with respect to 2-D CMOS while keeping manageable thermal profile. In this paper, we present the cost analysis"},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1709.01965","kind":"arxiv","version":2},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"}