{"paper":{"title":"Markov-Chain Formulation of Reaction-Diffusion Model and its Implications for Statistical Distribution of Interface Defects in Nanoscale Transistors","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":["physics.class-ph","physics.data-an"],"primary_cat":"cond-mat.mes-hall","authors_text":"Ahmad Ehteshamul Islam, Muhammad Ashraful Alam","submitted_at":"2010-11-14T17:19:56Z","abstract_excerpt":"Continued scaling of nanoscale transistors leads to broad device-to-device fluctuation of parameters due to random dopant effects, channel length variation, interface trap generation, etc. In this paper, we obtain the statistics of negative bias temperature instability (NBTI)-induced interface defect generation in ultra-scaled MOSFET by Markov Chain Monte-Carlo (MCMC) solution of Reaction-Diffusion (R-D) model. Our results show that the interface defect generation at a particular stress time, i.e., NIT}@tSTS in small transistors should follow a skew-normal distribution and that the generation "},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1011.3235","kind":"arxiv","version":2},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"}