{"paper":{"title":"The effect of RF-DC plasma N2-H2 in the selective hardening process for micro-patterned AISI420","license":"http://creativecommons.org/licenses/by/4.0/","headline":"","cross_cats":["physics.plasm-ph"],"primary_cat":"physics.app-ph","authors_text":"Dionisius Johanes Djoko Herry Santjojo, Hengky Herdianto, Masruroh","submitted_at":"2019-06-25T01:46:03Z","abstract_excerpt":"The high density of RF-DC plasma N2-H2 was used to make precise micro-texturing onto AISI420 has complex textured geometry. The original 2D micro-patterns were drawn onto substrate surface by maskless patterning using by of nano-carbon ink. These micro-patterned specimens were further plasma-nitrided at 673 K for 5.4 ks by 70 Pa using the hollow cathode device. The emissive light spectroscopy shows species in plasma were nitrogen atoms together with NH radicals and nitrogen molecular ions. Unprinted surface areas had selectively nitrided, have high nitrogen solute contents up to 12 mass%. Mask"},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1906.10687","kind":"arxiv","version":1},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"}