HEED replaces uniform residual alignment with density-weighted alignment using patch self-dissimilarity to improve hybrid VLM distillation, gaining 8.7 points on OCRBench v2 and 5.13 on a 10-benchmark average.
MMMU-Pro: A more robust multi-discipline multimodal understanding benchmark
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HEED: Density-Weighted Residual Alignment for Hybrid Vision-Language Model Distillation
HEED replaces uniform residual alignment with density-weighted alignment using patch self-dissimilarity to improve hybrid VLM distillation, gaining 8.7 points on OCRBench v2 and 5.13 on a 10-benchmark average.