pith. sign in

arxiv: 1507.01040 · v1 · pith:QUKCVAPXnew · submitted 2015-07-03 · ⚛️ physics.flu-dyn

A sharp-interface model of electrodeposition and ramified growth

classification ⚛️ physics.flu-dyn
keywords modelelectrodepositiongrowthramifiedsharp-interfaceanalysisbehaviorcomparing
0
0 comments X
read the original abstract

We present a sharp-interface model of two-dimensional ramified growth during quasi-steady electrodeposition. Our model differs from previous modeling methods in that it includes the important effects of extended space-charge regions and nonlinear electrode reactions. The model is validated by comparing its behavior in the initial stage with the predictions of a linear stability analysis.

This paper has not been read by Pith yet.

discussion (0)

Sign in with ORCID, Apple, or X to comment. Anyone can read and Pith papers without signing in.