{"as_of":"2026-08-16T13:14:00Z","caps":{"database_statements":6,"inbound":100,"outbound":100},"context_digest":"sha256:e2b39d3ae7211addb35d4aaf91b23646a924ea83ba82521744c789c7d36308b4","coverage":[{"denominator":25,"lane":"reference_resolution","note":"Typed states for the displayed outbound observations.","records_observed":25,"source":"paper_references, paper_reference_links","source_observed_at":"2026-08-02T00:02:34.995855Z","state":"measured"},{"denominator":25,"lane":"standing_notices","note":"One-hop event checks from named stored sources.","records_observed":25,"source":"scholarly_work_events, retraction_status_cache","source_observed_at":"2026-08-16T06:30:59.297886+00:00","state":"measured"},{"denominator":0,"lane":"inbound_itemization","note":"Pith citing papers itemized under the disclosed page cap.","records_observed":0,"source":"paper_references, paper_reference_links","source_observed_at":null,"state":"measured"},{"denominator":1,"lane":"external_citation_measurements","note":"A source-named dated measurement, never combined with another source.","records_observed":0,"source":"cited_works","source_observed_at":null,"state":"measured"}],"external_citation_measurements":[],"inbound":[],"links":{"evidence":"/evidence","html":"/paper/2607.15332/citation-record","integrity":"/paper/2607.15332/integrity","json":"/paper/2607.15332/citation-record.json","paper":"/paper/2607.15332"},"outbound":[{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:32.500009Z","title":null,"venue":null,"work_id":null,"year":2018},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":1,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:32.500009Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:6852b73bea3ea57e441136219d55e59ffa9e193f9029a9ea6e9de104eec13a55","observation_id":"455a2667-b72d-4fc8-b500-607bfd9d30c4","resolution":{"observed_at":"2026-08-02T00:02:32.500009Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:32.656482Z","title":"Liang, J","venue":null,"work_id":null,"year":2021},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":2,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:32.656482Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:fa4be9a1cb26733ab9bd9076c060814c88dc2a0916b208d6162913ea45c6120f","observation_id":"8cf67315-729a-4a3d-9645-fdc8f6c25ead","resolution":{"observed_at":"2026-08-02T00:02:32.656482Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:32.749194Z","title":null,"venue":null,"work_id":null,"year":2021},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":3,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:32.749194Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:6a602c8ba2d07046812b889a99555d353a2ce799e392948b42a4a0e06b72832a","observation_id":"fadbdbe8-e510-4f3b-b503-cc61ba22f85f","resolution":{"observed_at":"2026-08-02T00:02:32.749194Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:32.879099Z","title":null,"venue":null,"work_id":null,"year":1992},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":4,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:32.879099Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:fac1c04cfe378619efaa1c24d41021929d198befa51fa9b12d1624ae11c59a7c","observation_id":"4053d89c-04bb-49db-938a-3341dd9a21e0","resolution":{"observed_at":"2026-08-02T00:02:32.879099Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:32.952057Z","title":null,"venue":null,"work_id":null,"year":2019},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":5,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:32.952057Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:202816e938166abb7aa723d406b9591b15ff7888aab719440d0d77a248bc8d5d","observation_id":"3e3228dd-3764-451c-b3ac-1ba0d3e26863","resolution":{"observed_at":"2026-08-02T00:02:32.952057Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":"10.1063/1.2988294","metadata_source":"openalex","pith_arxiv_id":null,"snapshot_observed_at":"2026-08-05T02:28:24.338817Z","title":null,"venue":"Journal of Applied Physics","work_id":"121846f1-bec1-48ff-9ddb-08d7bd39cf89","year":2008},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":6,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:33.024469Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:872b1dba8b22d3992b13cd7d6efebfdc99627f47173eba55e165b08c3aa26426","observation_id":"b12831aa-79c5-49ab-819a-a6630bb3871d","resolution":{"observed_at":"2026-08-02T00:04:02.293202Z","resolver_source":"doi","status":"verified_exact"},"standing_notice":{"events":[],"observation":"No event found in the named queried sources as of 2026-08-16T06:30:59.297886+00:00.","reason":null,"source_receipts":[{"observed_at":"2026-08-16T06:30:59.297886+00:00","source":"crossref"},{"observed_at":"2026-08-16T06:30:54.164669+00:00","source":"retraction_watch"}],"state":"measured"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:33.101548Z","title":null,"venue":null,"work_id":null,"year":1991},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":7,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:33.101548Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:75ae638abec2896a56781011906816599b6c7e1ec1788c74f3e37334e4e6aeec","observation_id":"e6d7fc6c-36f8-4d93-9563-c733959fb784","resolution":{"observed_at":"2026-08-02T00:02:33.101548Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:33.264609Z","title":null,"venue":null,"work_id":null,"year":2003},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":8,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:33.264609Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:881021c4d3d0a7b6fa9ee491a0c0785c5ddb6cc8e720d96464b2dadfc6dcf24e","observation_id":"977d87e6-3eac-4d31-b193-82b3e2f7223b","resolution":{"observed_at":"2026-08-02T00:02:33.264609Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:33.341763Z","title":null,"venue":null,"work_id":null,"year":2016},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":9,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:33.341763Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:754e7659b4df503e1fb96e97d820c91d61e12c5d3610a46c66801f014018cb13","observation_id":"4ae95ebf-3b4a-48e0-82eb-f1bf5b78412f","resolution":{"observed_at":"2026-08-02T00:02:33.341763Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:33.452542Z","title":"Venkatasubramanian, M","venue":null,"work_id":null,"year":1991},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":10,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:33.452542Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:4f858140a784f994b861522c547dba18d8c09bf9fbd5bc7a001b06154b30a83b","observation_id":"301e4849-31eb-4db6-8f30-638a6a537252","resolution":{"observed_at":"2026-08-02T00:02:33.452542Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:33.586941Z","title":null,"venue":null,"work_id":null,"year":2005},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":11,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:33.586941Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:02f7b1d3b4da492f1fbfc1792ee3d66f4e228ae6bcbf44c3a4220b9287f46d1f","observation_id":"bde6ce6c-3852-4500-83e0-757d1943c79e","resolution":{"observed_at":"2026-08-02T00:02:33.586941Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:33.689207Z","title":null,"venue":null,"work_id":null,"year":2021},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":12,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:33.689207Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:474965825e4fb9f998c91fe1a9ee5804442ddd5c7301cd2ef809341407d320db","observation_id":"990aef53-c5f4-4a81-bc23-641a41b329dd","resolution":{"observed_at":"2026-08-02T00:02:33.689207Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:33.797730Z","title":null,"venue":null,"work_id":null,"year":1997},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":13,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:33.797730Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:099d70c234ce4f48c6549499a5d6b6f4b43be1e0ffc495f5997284a6b8823c76","observation_id":"568c04e4-d633-4f28-ab78-00d8435e4d5c","resolution":{"observed_at":"2026-08-02T00:02:33.797730Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:33.904151Z","title":"Horn-V on Hoegen, F","venue":null,"work_id":null,"year":1991},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":14,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:33.904151Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:88266ae160031354a507e7882b82028894aea3bc67bac21115c2d0ae8d7ebf37","observation_id":"c28f439a-c4b1-4253-8d99-ce1833256808","resolution":{"observed_at":"2026-08-02T00:02:33.904151Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:34.037321Z","title":null,"venue":null,"work_id":null,"year":1991},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":15,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:34.037321Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:2900405fe81af315b65139879894033f86ca27ff0014356dea7f9816952d95f6","observation_id":"4500b217-c92d-4e22-a491-a51ba9df820d","resolution":{"observed_at":"2026-08-02T00:02:34.037321Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:34.186035Z","title":"Kammler, M","venue":null,"work_id":null,"year":2004},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":16,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:34.186035Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:8f41e716437c8870a9fc8984fa4e0eda24bf01194a68a09dd323f9ac30ce5a26","observation_id":"f3163e17-995d-4508-8d08-1e83971c60c3","resolution":{"observed_at":"2026-08-02T00:02:34.186035Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:34.295012Z","title":null,"venue":null,"work_id":null,"year":2009},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":17,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:34.295012Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:d87499970d6531e6b3f095054996e7f58054b8ff272b1918edceeed7b98efad8","observation_id":"48de0513-60a0-490c-b4a5-63ec7851acfb","resolution":{"observed_at":"2026-08-02T00:02:34.295012Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":"10.1063/1.4998457","metadata_source":"openalex","pith_arxiv_id":null,"snapshot_observed_at":"2026-08-05T02:28:24.338817Z","title":"Anthony, Y","venue":"Journal of Applied Physics","work_id":"4a73347f-32ba-4e36-bcbb-119743ee222e","year":2017},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":18,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:34.396277Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:0812aeb1fb25d1430e3e370e5a362a5ff91c126df9fb1d66d290f378b9a557bf","observation_id":"4ccde367-d92c-4fdd-9892-c63d46c55c09","resolution":{"observed_at":"2026-08-02T00:04:02.086532Z","resolver_source":"doi","status":"verified_exact"},"standing_notice":{"events":[],"observation":"No event found in the named queried sources as of 2026-08-16T06:30:59.297886+00:00.","reason":null,"source_receipts":[{"observed_at":"2026-08-16T06:30:59.297886+00:00","source":"crossref"},{"observed_at":"2026-08-16T06:30:54.164669+00:00","source":"retraction_watch"}],"state":"measured"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:34.463309Z","title":null,"venue":null,"work_id":null,"year":1991},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":19,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:34.463309Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:46ada8a406a1c4aafe4b8dc3afe79b226f913c0ba54e3deab96c91f659c3aee1","observation_id":"b112d7c7-a2d9-4115-9e2e-648a357ebb22","resolution":{"observed_at":"2026-08-02T00:02:34.463309Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":"10.1002/admi.202400580","metadata_source":"openalex","pith_arxiv_id":null,"snapshot_observed_at":"2026-08-05T02:28:24.338817Z","title":null,"venue":"Advanced Materials Interfaces","work_id":"18167dab-d762-492a-8559-2c1d12498d68","year":2025},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":20,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:34.535671Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:9aac090da96adaaa7d564f676786714dbe5f9affd0603105cf294f6a05dc864b","observation_id":"18be9ad1-8d64-4fd4-851f-a612ede0f312","resolution":{"observed_at":"2026-08-02T00:04:01.611726Z","resolver_source":"doi","status":"verified_exact"},"standing_notice":{"events":[],"observation":"No event found in the named queried sources as of 2026-08-16T06:30:59.297886+00:00.","reason":null,"source_receipts":[{"observed_at":"2026-08-16T06:30:59.297886+00:00","source":"crossref"},{"observed_at":"2026-08-16T06:30:54.164669+00:00","source":"retraction_watch"}],"state":"measured"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:34.645234Z","title":"Ernst, P","venue":null,"work_id":null,"year":1992},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":21,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:34.645234Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:9d62986e61099c621f86bdf5fa8180cbdf1a3802cedd4127880188386939f350","observation_id":"ff7c6900-70d8-49a3-965b-eee87543750e","resolution":{"observed_at":"2026-08-02T00:02:34.645234Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:34.762078Z","title":"Ernst, Philosophical Magazine A 1993, 68, 1251","venue":null,"work_id":null,"year":1993},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":22,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:34.762078Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:d3fd451b1601acdd64db176342a4cfe63f70f9cf3d88a03a93233fcc83eeaf17","observation_id":"6f4b357f-7b6f-447a-936c-a863fc6dea76","resolution":{"observed_at":"2026-08-02T00:02:34.762078Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:34.815322Z","title":null,"venue":null,"work_id":null,"year":2006},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":23,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:34.815322Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:ea5e997223a8e01f074f8745c97dd502f392430c3fd58ca3a5b20f0702830a6e","observation_id":"5d911ec2-d2f7-42ed-9792-dbce69250d94","resolution":{"observed_at":"2026-08-02T00:02:34.815322Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:34.906251Z","title":"Sawano, Y","venue":null,"work_id":null,"year":2014},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":24,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:34.906251Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:bbdfbb4cb5b8236a663600135afc48e20b25d597265a6a0f3e72792f1e9072ed","observation_id":"87e88672-760d-46ca-914e-6a9f0f717f3d","resolution":{"observed_at":"2026-08-02T00:02:34.906251Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":null,"pith_arxiv_id":null,"snapshot_observed_at":"2026-08-02T00:02:34.995855Z","title":"Alberts, J","venue":null,"work_id":null,"year":1992},"citing_paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy","version":1},"reference_index":25,"source":"pdf_text","source_observed_at":"2026-08-02T00:02:34.995855Z"},"links":{"citing_paper":"/paper/2607.15332"},"observation_digest":"sha256:32e84f804daa0777e0dd38cb4204029a4ac6feab24894d8538cbbdb5638c9cf3","observation_id":"d8afe6e7-14d1-43fa-92e7-ca85cf57e709","resolution":{"observed_at":"2026-08-02T00:02:34.995855Z","resolver_source":null,"status":"unresolved"},"standing_notice":{"events":[],"reason":"canonical_work_link_unavailable","source_receipts":[],"state":"unavailable"}}],"paper":{"arxiv_id":"2607.15332","last_updated":"2026-07-16T16:22:10Z","latest_version":1,"primary_category":"cond-mat.mtrl-sci","snapshot_observed_at":"2026-08-02T00:02:31.075633Z","submitted_at":"2026-07-16T16:22:10Z","title":"Spontaneous Nanopatterning and Strain Relaxation in SiGe Layers Grown by Oxidative Solid Phase Epitaxy"},"reference_resolution":{"displayed":25,"state_counts":{"malformed_identifier":0,"metadata_mismatch":0,"parse_uncertain":0,"unresolved":22,"verified_exact":3,"verified_fuzzy":0},"total_outbound_references":25},"refusal":"A citation records a reference. It does not transfer a finding from one paper to another.","schema":"pith.paper-citation-record.v1","standing_sources":[{"observed_at":"2026-08-16T06:30:59.297886+00:00","source":"crossref"},{"observed_at":"2026-08-16T06:30:54.164669+00:00","source":"retraction_watch"}],"thesis":"As of 16 August 2026, this Paper Citation Record lists 25 of 25 outbound references and 0 inbound Pith citation observations for arXiv:2607.15332."}