{"as_of":"2026-08-20T17:47:00Z","caps":{"database_statements":6,"inbound":100,"outbound":100},"context_digest":"sha256:ea29fdf72c31644fad2a7f105650d10af31e4d975f31cf16ceac9edb5003ad3d","coverage":[{"denominator":12,"lane":"reference_resolution","note":"Typed states for the displayed outbound observations.","records_observed":12,"source":"paper_references, paper_reference_links","source_observed_at":"2026-08-08T12:14:11.936367Z","state":"measured"},{"denominator":12,"lane":"standing_notices","note":"One-hop event checks from named stored sources.","records_observed":12,"source":"scholarly_work_events, retraction_status_cache","source_observed_at":"2026-08-20T06:33:59.587034+00:00","state":"measured"},{"denominator":0,"lane":"inbound_itemization","note":"Pith citing papers itemized under the disclosed page cap.","records_observed":0,"source":"paper_references, paper_reference_links","source_observed_at":null,"state":"measured"},{"denominator":1,"lane":"external_citation_measurements","note":"A source-named dated measurement, never combined with another source.","records_observed":0,"source":"cited_works","source_observed_at":null,"state":"measured"}],"external_citation_measurements":[],"inbound":[],"links":{"evidence":"/evidence","html":"/paper/2608.05488/citation-record","integrity":"/paper/2608.05488/integrity","json":"/paper/2608.05488/citation-record.json","paper":"/paper/2608.05488"},"outbound":[{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":"raw_reference","pith_arxiv_id":null,"snapshot_observed_at":"2026-08-08T12:14:12.145010Z","title":"Interference lithography at euv and soft x-ray wavelengths: Principles, methods, and applications,","venue":null,"work_id":"b8e7ae5e-b9a3-4a86-bad4-b45aed25266a","year":2015},"citing_paper":{"arxiv_id":"2608.05488","last_updated":"2026-08-06T00:37:08Z","snapshot_observed_at":"2026-08-16T20:29:05.819545Z","submitted_at":"2026-08-06T00:37:08Z","title":"Inverse mask design for interference lithography using automatic differentiable wave propagation","version":1},"reference_index":1,"source":"pdf_text","source_observed_at":"2026-08-08T12:14:11.882903Z"},"links":{"citing_paper":"/paper/2608.05488"},"observation_digest":"sha256:a19df0dadd8b80fffb28248b7f1a716adc51a79573231a88ca7ba5e3c39c63fd","observation_id":"d9dbe50c-b945-4964-8d1f-5158b53329de","resolution":{"observed_at":"2026-08-08T12:14:12.149855Z","resolver_source":"raw_fallback","status":"verified_fuzzy"},"standing_notice":{"events":[],"observation":"No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.","reason":null,"source_receipts":[{"observed_at":"2026-08-20T06:33:59.587034+00:00","source":"crossref"},{"observed_at":"2026-08-20T06:33:54.927442+00:00","source":"retraction_watch"}],"state":"measured"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":"raw_reference","pith_arxiv_id":null,"snapshot_observed_at":"2026-08-08T12:14:12.129620Z","title":"Extreme ultraviolet lithography reaches 5 nm resolution,","venue":null,"work_id":"bfd76b4e-5a01-4dfc-abb6-5c49a5a8e65e","year":2024},"citing_paper":{"arxiv_id":"2608.05488","last_updated":"2026-08-06T00:37:08Z","snapshot_observed_at":"2026-08-16T20:29:05.819545Z","submitted_at":"2026-08-06T00:37:08Z","title":"Inverse mask design for interference lithography using automatic differentiable wave propagation","version":1},"reference_index":2,"source":"pdf_text","source_observed_at":"2026-08-08T12:14:11.888140Z"},"links":{"citing_paper":"/paper/2608.05488"},"observation_digest":"sha256:5513f7d77cf782059ec3bbcc5777ee2bbe8a66e868cd585b99e67bf190e0d964","observation_id":"37e7ab2d-3b7d-4d9e-874f-2e20019003b3","resolution":{"observed_at":"2026-08-08T12:14:12.134383Z","resolver_source":"raw_fallback","status":"verified_fuzzy"},"standing_notice":{"events":[],"observation":"No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.","reason":null,"source_receipts":[{"observed_at":"2026-08-20T06:33:59.587034+00:00","source":"crossref"},{"observed_at":"2026-08-20T06:33:54.927442+00:00","source":"retraction_watch"}],"state":"measured"}},{"citation":{"cited_paper":{"arxiv_id":"2605.21430","last_updated":"2026-05-20T17:23:22Z","snapshot_observed_at":"2026-08-19T04:27:44.761505Z","submitted_at":"2026-05-20T17:23:22Z","title":"Holographic EUV Lithography at 40 nm Resolution","version":1},"cited_work":{"arxiv_id":"2605.21430","doi":null,"metadata_source":"pith","pith_arxiv_id":"2605.21430","snapshot_observed_at":"2026-08-08T12:14:11.971660Z","title":"Holographic EUV Lithography at 40 nm Resolution","venue":"physics.optics","work_id":"48be411c-e00c-4a63-90f8-9bdbdf2f4f5a","year":2026},"citing_paper":{"arxiv_id":"2608.05488","last_updated":"2026-08-06T00:37:08Z","snapshot_observed_at":"2026-08-16T20:29:05.819545Z","submitted_at":"2026-08-06T00:37:08Z","title":"Inverse mask design for interference lithography using automatic differentiable wave propagation","version":1},"reference_index":3,"source":"pdf_text","source_observed_at":"2026-08-08T12:14:11.892951Z"},"links":{"cited_paper":"/paper/2605.21430","citing_paper":"/paper/2608.05488"},"observation_digest":"sha256:cdedd9d7de3f34d0b547f19e3ec9110d3df4560069a81ce8571aff2254788821","observation_id":"49d55e06-8990-4af5-9c95-d9b5d5edace2","resolution":{"observed_at":"2026-08-08T12:14:11.978138Z","resolver_source":"local_arxiv","status":"verified_exact"},"standing_notice":{"events":[],"observation":"No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.","reason":null,"source_receipts":[{"observed_at":"2026-08-20T06:33:59.587034+00:00","source":"crossref"},{"observed_at":"2026-08-20T06:33:54.927442+00:00","source":"retraction_watch"}],"state":"measured"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":"raw_reference","pith_arxiv_id":null,"snapshot_observed_at":"2026-08-08T12:14:12.114558Z","title":"S., Nam, C.-Y., and Yoo, S., [Physics-Informed Machine Learning for Mask Design in Interference Lithography], 1–4, Society for Industrial and Applied Mathematics (2025)","venue":null,"work_id":"a77376d9-8b6c-45c9-a2b9-2ff9ac487f94","year":2025},"citing_paper":{"arxiv_id":"2608.05488","last_updated":"2026-08-06T00:37:08Z","snapshot_observed_at":"2026-08-16T20:29:05.819545Z","submitted_at":"2026-08-06T00:37:08Z","title":"Inverse mask design for interference lithography using automatic differentiable wave propagation","version":1},"reference_index":4,"source":"pdf_text","source_observed_at":"2026-08-08T12:14:11.899218Z"},"links":{"citing_paper":"/paper/2608.05488"},"observation_digest":"sha256:db5e19b76034414b251b8dc1c34c993927da28d93005a7688cc15015503e8bd7","observation_id":"54c24ab9-d530-498e-9fa6-0702b625dbf0","resolution":{"observed_at":"2026-08-08T12:14:12.119491Z","resolver_source":"raw_fallback","status":"verified_fuzzy"},"standing_notice":{"events":[],"observation":"No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.","reason":null,"source_receipts":[{"observed_at":"2026-08-20T06:33:59.587034+00:00","source":"crossref"},{"observed_at":"2026-08-20T06:33:54.927442+00:00","source":"retraction_watch"}],"state":"measured"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":"raw_reference","pith_arxiv_id":null,"snapshot_observed_at":"2026-08-08T12:14:12.099320Z","title":"Band-limited angular spectrum method for numerical simulation of free-space propagation in far and near fields,","venue":null,"work_id":"4fe7d494-5122-4c67-a036-1244ce28a7e2","year":2009},"citing_paper":{"arxiv_id":"2608.05488","last_updated":"2026-08-06T00:37:08Z","snapshot_observed_at":"2026-08-16T20:29:05.819545Z","submitted_at":"2026-08-06T00:37:08Z","title":"Inverse mask design for interference lithography using automatic differentiable wave propagation","version":1},"reference_index":5,"source":"pdf_text","source_observed_at":"2026-08-08T12:14:11.903775Z"},"links":{"citing_paper":"/paper/2608.05488"},"observation_digest":"sha256:0f45548f98ee6cafb05864c73e310a7a96463768853673284f9b2666d5b09ad6","observation_id":"27e4b021-cf32-47b0-bf70-8f6462b20c3b","resolution":{"observed_at":"2026-08-08T12:14:12.104319Z","resolver_source":"raw_fallback","status":"verified_fuzzy"},"standing_notice":{"events":[],"observation":"No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.","reason":null,"source_receipts":[{"observed_at":"2026-08-20T06:33:59.587034+00:00","source":"crossref"},{"observed_at":"2026-08-20T06:33:54.927442+00:00","source":"retraction_watch"}],"state":"measured"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":"raw_reference","pith_arxiv_id":null,"snapshot_observed_at":"2026-08-08T12:14:12.083470Z","title":"Shifted angular spectrum method for off-axis numerical propagation,","venue":null,"work_id":"61bed1a7-f585-4da4-9c4a-e5ce2539198b","year":2010},"citing_paper":{"arxiv_id":"2608.05488","last_updated":"2026-08-06T00:37:08Z","snapshot_observed_at":"2026-08-16T20:29:05.819545Z","submitted_at":"2026-08-06T00:37:08Z","title":"Inverse mask design for interference lithography using automatic differentiable wave propagation","version":1},"reference_index":6,"source":"pdf_text","source_observed_at":"2026-08-08T12:14:11.908607Z"},"links":{"citing_paper":"/paper/2608.05488"},"observation_digest":"sha256:393b454e951638742fad2527de58009d7af9a80bc0e1b9d03b8d78bceb464f92","observation_id":"8d11bef7-8584-4f9b-b449-7506cc365e00","resolution":{"observed_at":"2026-08-08T12:14:12.089140Z","resolver_source":"raw_fallback","status":"verified_fuzzy"},"standing_notice":{"events":[],"observation":"No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.","reason":null,"source_receipts":[{"observed_at":"2026-08-20T06:33:59.587034+00:00","source":"crossref"},{"observed_at":"2026-08-20T06:33:54.927442+00:00","source":"retraction_watch"}],"state":"measured"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":"raw_reference","pith_arxiv_id":null,"snapshot_observed_at":"2026-08-08T12:14:12.068176Z","title":"Dose-efficient automatic differentiation for ptychographic reconstruction,","venue":null,"work_id":"59c476f2-7a5a-4274-b496-5f583658b191","year":2024},"citing_paper":{"arxiv_id":"2608.05488","last_updated":"2026-08-06T00:37:08Z","snapshot_observed_at":"2026-08-16T20:29:05.819545Z","submitted_at":"2026-08-06T00:37:08Z","title":"Inverse mask design for interference lithography using automatic differentiable wave propagation","version":1},"reference_index":7,"source":"pdf_text","source_observed_at":"2026-08-08T12:14:11.914226Z"},"links":{"citing_paper":"/paper/2608.05488"},"observation_digest":"sha256:df81eef1d494112543d0b4973d6d1e0f2270432818ff7154527d96041796089f","observation_id":"c2426c4c-ee77-47a6-8ffb-701c33b5703f","resolution":{"observed_at":"2026-08-08T12:14:12.073357Z","resolver_source":"raw_fallback","status":"verified_fuzzy"},"standing_notice":{"events":[],"observation":"No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.","reason":null,"source_receipts":[{"observed_at":"2026-08-20T06:33:59.587034+00:00","source":"crossref"},{"observed_at":"2026-08-20T06:33:54.927442+00:00","source":"retraction_watch"}],"state":"measured"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":"raw_reference","pith_arxiv_id":null,"snapshot_observed_at":"2026-08-08T12:14:12.051019Z","title":"Au- tophasenn: unsupervised physics-aware deep learning of 3d nanoscale bragg coherent diffraction imaging,","venue":null,"work_id":"e6f3091c-0d24-4acf-9829-1a0669c99cf0","year":2022},"citing_paper":{"arxiv_id":"2608.05488","last_updated":"2026-08-06T00:37:08Z","snapshot_observed_at":"2026-08-16T20:29:05.819545Z","submitted_at":"2026-08-06T00:37:08Z","title":"Inverse mask design for interference lithography using automatic differentiable wave propagation","version":1},"reference_index":8,"source":"pdf_text","source_observed_at":"2026-08-08T12:14:11.918743Z"},"links":{"citing_paper":"/paper/2608.05488"},"observation_digest":"sha256:5b5d33762b50ddc505d02be25c32abfd8f5163db78af8e7ae1561a51de8db205","observation_id":"6ffc03dc-88d9-488b-b798-c1a584f1bb6b","resolution":{"observed_at":"2026-08-08T12:14:12.056823Z","resolver_source":"raw_fallback","status":"verified_fuzzy"},"standing_notice":{"events":[],"observation":"No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.","reason":null,"source_receipts":[{"observed_at":"2026-08-20T06:33:59.587034+00:00","source":"crossref"},{"observed_at":"2026-08-20T06:33:54.927442+00:00","source":"retraction_watch"}],"state":"measured"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":"raw_reference","pith_arxiv_id":null,"snapshot_observed_at":"2026-08-08T12:14:12.035853Z","title":"Enhanced EUV mask imaging using Fourier ptychographic microscopy,","venue":null,"work_id":"bc7278be-b99c-4293-b061-deb0ce6f9cff","year":2025},"citing_paper":{"arxiv_id":"2608.05488","last_updated":"2026-08-06T00:37:08Z","snapshot_observed_at":"2026-08-16T20:29:05.819545Z","submitted_at":"2026-08-06T00:37:08Z","title":"Inverse mask design for interference lithography using automatic differentiable wave propagation","version":1},"reference_index":9,"source":"pdf_text","source_observed_at":"2026-08-08T12:14:11.923207Z"},"links":{"citing_paper":"/paper/2608.05488"},"observation_digest":"sha256:f8bc45a0f233f5da0af08adf11693333a4645cfc0496eece48b80dd207a7a38e","observation_id":"9df76d40-d81e-4901-a9b0-dbd4d0910ee8","resolution":{"observed_at":"2026-08-08T12:14:12.041091Z","resolver_source":"raw_fallback","status":"verified_fuzzy"},"standing_notice":{"events":[],"observation":"No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.","reason":null,"source_receipts":[{"observed_at":"2026-08-20T06:33:59.587034+00:00","source":"crossref"},{"observed_at":"2026-08-20T06:33:54.927442+00:00","source":"retraction_watch"}],"state":"measured"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":"raw_reference","pith_arxiv_id":null,"snapshot_observed_at":"2026-08-08T12:14:12.021035Z","title":"Open-source differentiable lithography imaging framework,","venue":null,"work_id":"5e4b0fd9-cbef-45fb-a914-be6095407404","year":2024},"citing_paper":{"arxiv_id":"2608.05488","last_updated":"2026-08-06T00:37:08Z","snapshot_observed_at":"2026-08-16T20:29:05.819545Z","submitted_at":"2026-08-06T00:37:08Z","title":"Inverse mask design for interference lithography using automatic differentiable wave propagation","version":1},"reference_index":10,"source":"pdf_text","source_observed_at":"2026-08-08T12:14:11.927467Z"},"links":{"citing_paper":"/paper/2608.05488"},"observation_digest":"sha256:72dd8a2d4fdc1e05295fd8c1c5130f8c094bb83e2ad114a1ee222741b17e9307","observation_id":"d26bb72f-bfe0-42c5-a98c-ddc1b6f9b561","resolution":{"observed_at":"2026-08-08T12:14:12.025761Z","resolver_source":"raw_fallback","status":"verified_fuzzy"},"standing_notice":{"events":[],"observation":"No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.","reason":null,"source_receipts":[{"observed_at":"2026-08-20T06:33:59.587034+00:00","source":"crossref"},{"observed_at":"2026-08-20T06:33:54.927442+00:00","source":"retraction_watch"}],"state":"measured"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":"raw_reference","pith_arxiv_id":null,"snapshot_observed_at":"2026-08-08T12:14:12.005623Z","title":"Shifted fresnel diffraction for computational holography,","venue":null,"work_id":"77b6c512-2d7d-4b33-bb73-1efc8b27b317","year":2007},"citing_paper":{"arxiv_id":"2608.05488","last_updated":"2026-08-06T00:37:08Z","snapshot_observed_at":"2026-08-16T20:29:05.819545Z","submitted_at":"2026-08-06T00:37:08Z","title":"Inverse mask design for interference lithography using automatic differentiable wave propagation","version":1},"reference_index":11,"source":"pdf_text","source_observed_at":"2026-08-08T12:14:11.931885Z"},"links":{"citing_paper":"/paper/2608.05488"},"observation_digest":"sha256:dfd4f24a91e2b23dbcde82495d8f78aa529b8dd049d419924e676d6a0bf5aabb","observation_id":"dd79ac73-68d9-4886-9777-bd48102cbfb8","resolution":{"observed_at":"2026-08-08T12:14:12.010354Z","resolver_source":"raw_fallback","status":"verified_fuzzy"},"standing_notice":{"events":[],"observation":"No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.","reason":null,"source_receipts":[{"observed_at":"2026-08-20T06:33:59.587034+00:00","source":"crossref"},{"observed_at":"2026-08-20T06:33:54.927442+00:00","source":"retraction_watch"}],"state":"measured"}},{"citation":{"cited_paper":null,"cited_work":{"arxiv_id":null,"doi":null,"metadata_source":"raw_reference","pith_arxiv_id":null,"snapshot_observed_at":"2026-08-08T12:14:11.988923Z","title":"Adam: A method for stochastic optimization,","venue":null,"work_id":"32d32a15-12b8-43c3-92bc-7f76d1598ff0","year":2015},"citing_paper":{"arxiv_id":"2608.05488","last_updated":"2026-08-06T00:37:08Z","snapshot_observed_at":"2026-08-16T20:29:05.819545Z","submitted_at":"2026-08-06T00:37:08Z","title":"Inverse mask design for interference lithography using automatic differentiable wave propagation","version":1},"reference_index":12,"source":"pdf_text","source_observed_at":"2026-08-08T12:14:11.936367Z"},"links":{"citing_paper":"/paper/2608.05488"},"observation_digest":"sha256:e54f421f984b5b4d71169cc0510a87ff44df523d8006da4f7dd7bd2560c130f2","observation_id":"bdd24b69-9a00-4b2b-9bcd-d13b0f4d0636","resolution":{"observed_at":"2026-08-08T12:14:11.995395Z","resolver_source":"raw_fallback","status":"verified_fuzzy"},"standing_notice":{"events":[],"observation":"No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.","reason":null,"source_receipts":[{"observed_at":"2026-08-20T06:33:59.587034+00:00","source":"crossref"},{"observed_at":"2026-08-20T06:33:54.927442+00:00","source":"retraction_watch"}],"state":"measured"}}],"paper":{"arxiv_id":"2608.05488","last_updated":"2026-08-06T00:37:08Z","latest_version":1,"primary_category":"physics.optics","snapshot_observed_at":"2026-08-16T20:29:05.819545Z","submitted_at":"2026-08-06T00:37:08Z","title":"Inverse mask design for interference lithography using automatic differentiable wave propagation"},"reference_resolution":{"displayed":12,"state_counts":{"malformed_identifier":0,"metadata_mismatch":0,"parse_uncertain":0,"unresolved":0,"verified_exact":1,"verified_fuzzy":11},"total_outbound_references":12},"refusal":"A citation records a reference. It does not transfer a finding from one paper to another.","schema":"pith.paper-citation-record.v1","standing_sources":[{"observed_at":"2026-08-20T06:33:59.587034+00:00","source":"crossref"},{"observed_at":"2026-08-20T06:33:54.927442+00:00","source":"retraction_watch"}],"thesis":"As of 20 August 2026, this Paper Citation Record lists 12 of 12 outbound references and 0 inbound Pith citation observations for arXiv:2608.05488."}