{"record_type":"pith_number_record","schema_url":"https://pith.science/schemas/pith-number/v1.json","pith_number":"pith:2017:4BRBZUJTGDHU5YLSTNCT4S7UQZ","short_pith_number":"pith:4BRBZUJT","schema_version":"1.0","canonical_sha256":"e0621cd13330cf4ee1729b453e4bf486642fe4e1864c461a75e02ebabf51feda","source":{"kind":"arxiv","id":"1703.04762","version":1},"attestation_state":"computed","paper":{"title":"Anisotropic Etching of Graphite and Graphene in a Remote Hydrogen Plasma","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":[],"primary_cat":"cond-mat.mes-hall","authors_text":"Dominik M. Zumb\\\"uhl, Dorothee Hug, Kenji Watanabe, Laurent Marot, Mirko K. Rehmann, Simon Zihlmann, Takashi Taniguchi, Timothy N. Camenzind, Yemliha B. Kalyoncu","submitted_at":"2017-03-14T22:14:56Z","abstract_excerpt":"We investigate the etching of a pure hydrogen plasma on graphite samples and graphene flakes on SiO$_2$ and hexagonal Boron-Nitride (hBN) substrates. The pressure and distance dependence of the graphite exposure experiments reveals the existence of two distinct plasma regimes: the direct and the remote plasma regime. Graphite surfaces exposed directly to the hydrogen plasma exhibit numerous etch pits of various size and depth, indicating continuous defect creation throughout the etching process. In contrast, anisotropic etching forming regular and symmetric hexagons starting only from preexist"},"verification_status":{"content_addressed":true,"pith_receipt":true,"author_attested":false,"weak_author_claims":0,"strong_author_claims":0,"externally_anchored":false,"storage_verified":false,"citation_signatures":0,"replication_records":0,"graph_snapshot":true,"references_resolved":false,"formal_links_present":false},"canonical_record":{"source":{"id":"1703.04762","kind":"arxiv","version":1},"metadata":{"license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","primary_cat":"cond-mat.mes-hall","submitted_at":"2017-03-14T22:14:56Z","cross_cats_sorted":[],"title_canon_sha256":"ec14bef28d826e966e457722d9adf833d38e78257eb5116236677059207b8373","abstract_canon_sha256":"dfa03c9b3f6202199394087b0e7b8086d2277e2d2cacd72fac3c97f8367efcb5"},"schema_version":"1.0"},"receipt":{"kind":"pith_receipt","key_id":"pith-v1-2026-05","algorithm":"ed25519","signed_at":"2026-05-18T00:32:59.829912Z","signature_b64":"qcVNEk5Fc+dPoANnevNfWCwm3RGnZP+KR3Jyd/Oi29wdfObCcJUGcjpQ+cF5h6ihqpUaOfDel9WnVgfvBIXxBQ==","signed_message":"canonical_sha256_bytes","builder_version":"pith-number-builder-2026-05-17-v1","receipt_version":"0.3","canonical_sha256":"e0621cd13330cf4ee1729b453e4bf486642fe4e1864c461a75e02ebabf51feda","last_reissued_at":"2026-05-18T00:32:59.829338Z","signature_status":"signed_v1","first_computed_at":"2026-05-18T00:32:59.829338Z","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54"},"graph_snapshot":{"paper":{"title":"Anisotropic Etching of Graphite and Graphene in a Remote Hydrogen Plasma","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":[],"primary_cat":"cond-mat.mes-hall","authors_text":"Dominik M. Zumb\\\"uhl, Dorothee Hug, Kenji Watanabe, Laurent Marot, Mirko K. Rehmann, Simon Zihlmann, Takashi Taniguchi, Timothy N. Camenzind, Yemliha B. Kalyoncu","submitted_at":"2017-03-14T22:14:56Z","abstract_excerpt":"We investigate the etching of a pure hydrogen plasma on graphite samples and graphene flakes on SiO$_2$ and hexagonal Boron-Nitride (hBN) substrates. The pressure and distance dependence of the graphite exposure experiments reveals the existence of two distinct plasma regimes: the direct and the remote plasma regime. Graphite surfaces exposed directly to the hydrogen plasma exhibit numerous etch pits of various size and depth, indicating continuous defect creation throughout the etching process. In contrast, anisotropic etching forming regular and symmetric hexagons starting only from preexist"},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1703.04762","kind":"arxiv","version":1},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"},"aliases":[{"alias_kind":"arxiv","alias_value":"1703.04762","created_at":"2026-05-18T00:32:59.829419+00:00"},{"alias_kind":"arxiv_version","alias_value":"1703.04762v1","created_at":"2026-05-18T00:32:59.829419+00:00"},{"alias_kind":"doi","alias_value":"10.48550/arxiv.1703.04762","created_at":"2026-05-18T00:32:59.829419+00:00"},{"alias_kind":"pith_short_12","alias_value":"4BRBZUJTGDHU","created_at":"2026-05-18T12:30:58.224056+00:00"},{"alias_kind":"pith_short_16","alias_value":"4BRBZUJTGDHU5YLS","created_at":"2026-05-18T12:30:58.224056+00:00"},{"alias_kind":"pith_short_8","alias_value":"4BRBZUJT","created_at":"2026-05-18T12:30:58.224056+00:00"}],"events":[],"event_summary":{},"paper_claims":[],"inbound_citations":{"count":0,"internal_anchor_count":0,"sample":[]},"formal_canon":{"evidence_count":0,"sample":[],"anchors":[]},"links":{"html":"https://pith.science/pith/4BRBZUJTGDHU5YLSTNCT4S7UQZ","json":"https://pith.science/pith/4BRBZUJTGDHU5YLSTNCT4S7UQZ.json","graph_json":"https://pith.science/api/pith-number/4BRBZUJTGDHU5YLSTNCT4S7UQZ/graph.json","events_json":"https://pith.science/api/pith-number/4BRBZUJTGDHU5YLSTNCT4S7UQZ/events.json","paper":"https://pith.science/paper/4BRBZUJT"},"agent_actions":{"view_html":"https://pith.science/pith/4BRBZUJTGDHU5YLSTNCT4S7UQZ","download_json":"https://pith.science/pith/4BRBZUJTGDHU5YLSTNCT4S7UQZ.json","view_paper":"https://pith.science/paper/4BRBZUJT","resolve_alias":"https://pith.science/api/pith-number/resolve?arxiv=1703.04762&json=true","fetch_graph":"https://pith.science/api/pith-number/4BRBZUJTGDHU5YLSTNCT4S7UQZ/graph.json","fetch_events":"https://pith.science/api/pith-number/4BRBZUJTGDHU5YLSTNCT4S7UQZ/events.json","actions":{"anchor_timestamp":"https://pith.science/pith/4BRBZUJTGDHU5YLSTNCT4S7UQZ/action/timestamp_anchor","attest_storage":"https://pith.science/pith/4BRBZUJTGDHU5YLSTNCT4S7UQZ/action/storage_attestation","attest_author":"https://pith.science/pith/4BRBZUJTGDHU5YLSTNCT4S7UQZ/action/author_attestation","sign_citation":"https://pith.science/pith/4BRBZUJTGDHU5YLSTNCT4S7UQZ/action/citation_signature","submit_replication":"https://pith.science/pith/4BRBZUJTGDHU5YLSTNCT4S7UQZ/action/replication_record"}},"created_at":"2026-05-18T00:32:59.829419+00:00","updated_at":"2026-05-18T00:32:59.829419+00:00"}