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We obtain a yield of Mu into vacuum of (38\\pm4)% at 250 K temperature and (20\\pm4)% at 100 K for 5 keV {\\mu}+ implantation energy. From the implantation energy dependence of the Mu vacuum yield we determine the Mu diffusion constants in these films: D250KMu = (1.6 \\pm 0.1) \\times 10-4 cm2/s and D100KMu = (4.2\\pm0.5)\\times10-5 cm2/s. Describing the diffusion process as quantum mechanical tunneling from pore-to-pore, we reproduce the measured temperature dependence T^3/2 of the diffusion c"},"verification_status":{"content_addressed":true,"pith_receipt":true,"author_attested":false,"weak_author_claims":0,"strong_author_claims":0,"externally_anchored":false,"storage_verified":false,"citation_signatures":0,"replication_records":0,"graph_snapshot":true,"references_resolved":false,"formal_links_present":false},"canonical_record":{"source":{"id":"1112.4887","kind":"arxiv","version":1},"metadata":{"license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","primary_cat":"physics.atom-ph","submitted_at":"2011-12-20T23:43:58Z","cross_cats_sorted":["hep-ex"],"title_canon_sha256":"02f2ae84cd9dd9a09c553791062774e741966e6264438ad0f70e7b9ddc7a5032","abstract_canon_sha256":"1e9c6a384598c32b961683e1734dd33ada8071c7de43bffa41a964a922fd25f2"},"schema_version":"1.0"},"receipt":{"kind":"pith_receipt","key_id":"pith-v1-2026-05","algorithm":"ed25519","signed_at":"2026-05-18T03:22:53.745675Z","signature_b64":"oQOFhr6K5fg0bT7DShVsDLtP9T5JB0keebBa2DG8oqVOTuWWqUzP7t1T6PxxrsG7Bor8k1UY0z2wFzly3wMACA==","signed_message":"canonical_sha256_bytes","builder_version":"pith-number-builder-2026-05-17-v1","receipt_version":"0.3","canonical_sha256":"080cd381c86fd8d5016072c8f028a04f4b5fddad3811a9dd3336800dcd4b7321","last_reissued_at":"2026-05-18T03:22:53.744971Z","signature_status":"signed_v1","first_computed_at":"2026-05-18T03:22:53.744971Z","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54"},"graph_snapshot":{"paper":{"title":"Muonium emission into vacuum from mesoporous thin films at cryogenic temperatures","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":["hep-ex"],"primary_cat":"physics.atom-ph","authors_text":"A. Antognini, A. Suter, B. Barbiellini, E. Morenzoni, F. M. Piegsa, K. Kirch, K. Kwuida, K. S. Khaw, L. Liszkay, P. Crivelli, T. Prokscha, Z. Salman","submitted_at":"2011-12-20T23:43:58Z","abstract_excerpt":"We report on Muonium (Mu) emission into vacuum following {\\mu}+ implantation in mesoporous thin SiO2 films. We obtain a yield of Mu into vacuum of (38\\pm4)% at 250 K temperature and (20\\pm4)% at 100 K for 5 keV {\\mu}+ implantation energy. From the implantation energy dependence of the Mu vacuum yield we determine the Mu diffusion constants in these films: D250KMu = (1.6 \\pm 0.1) \\times 10-4 cm2/s and D100KMu = (4.2\\pm0.5)\\times10-5 cm2/s. 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