{"record_type":"pith_number_record","schema_url":"https://pith.science/schemas/pith-number/v1.json","pith_number":"pith:2014:HSWIAO5SOREYL73J4JA2KK6L3W","short_pith_number":"pith:HSWIAO5S","schema_version":"1.0","canonical_sha256":"3cac803bb2744985ff69e241a52bcbdd9c0b24f8e050a4a69cf35468330372e2","source":{"kind":"arxiv","id":"1408.5829","version":2},"attestation_state":"computed","paper":{"title":"Fabrication Process and Properties of Fully-Planarized Deep-Submicron Nb/Al-AlOx/Nb Josephson Junctions for VLSI Circuits","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":[],"primary_cat":"cond-mat.supr-con","authors_text":"Leonard M. Johnson, Mark A. Gouker, Sergey K. Tolpygo, Terence J. Weir, Vladimir Bolkhovsky, William D. Oliver","submitted_at":"2014-08-25T16:40:09Z","abstract_excerpt":"A fabrication process for Nb/Al-AlOx/Nb Josephson junctions (JJs) with sizes down to 200 nm has been developed on a 200-mm-wafer tool set typical for CMOS foundry. This process is the core of several nodes of a roadmap for fully-planarized fabrication processes for superconductor integrated circuits with 4, 8, and 10 niobium layers developed at MIT Lincoln Laboratory. The process utilizes 248 nm photolithography, anodization, high-density plasma etching, and chemical mechanical polishing (CMP) for planarization of SiO$_2$ interlayer dielectric. JJ electric properties and statistics such as on-"},"verification_status":{"content_addressed":true,"pith_receipt":true,"author_attested":false,"weak_author_claims":0,"strong_author_claims":0,"externally_anchored":false,"storage_verified":false,"citation_signatures":0,"replication_records":0,"graph_snapshot":true,"references_resolved":false,"formal_links_present":false},"canonical_record":{"source":{"id":"1408.5829","kind":"arxiv","version":2},"metadata":{"license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","primary_cat":"cond-mat.supr-con","submitted_at":"2014-08-25T16:40:09Z","cross_cats_sorted":[],"title_canon_sha256":"74329cb54b75e2d007d674beac76129543c0a850fb7d9129dc4ab1e23e6a5242","abstract_canon_sha256":"091d5ecf61fb16efd38f2a41ce2792151edfa9850094a47151792d1218f14622"},"schema_version":"1.0"},"receipt":{"kind":"pith_receipt","key_id":"pith-v1-2026-05","algorithm":"ed25519","signed_at":"2026-05-18T01:20:59.418035Z","signature_b64":"yy9bVYHiYQvone+MESrh9TjkeqQGrwE9NwkmQgQM/OfA0BCzocAcWMQ1cYG+ln7GLwXrnar5kJsBcbYuXebACQ==","signed_message":"canonical_sha256_bytes","builder_version":"pith-number-builder-2026-05-17-v1","receipt_version":"0.3","canonical_sha256":"3cac803bb2744985ff69e241a52bcbdd9c0b24f8e050a4a69cf35468330372e2","last_reissued_at":"2026-05-18T01:20:59.417454Z","signature_status":"signed_v1","first_computed_at":"2026-05-18T01:20:59.417454Z","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54"},"graph_snapshot":{"paper":{"title":"Fabrication Process and Properties of Fully-Planarized Deep-Submicron Nb/Al-AlOx/Nb Josephson Junctions for VLSI Circuits","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":[],"primary_cat":"cond-mat.supr-con","authors_text":"Leonard M. Johnson, Mark A. Gouker, Sergey K. Tolpygo, Terence J. Weir, Vladimir Bolkhovsky, William D. Oliver","submitted_at":"2014-08-25T16:40:09Z","abstract_excerpt":"A fabrication process for Nb/Al-AlOx/Nb Josephson junctions (JJs) with sizes down to 200 nm has been developed on a 200-mm-wafer tool set typical for CMOS foundry. This process is the core of several nodes of a roadmap for fully-planarized fabrication processes for superconductor integrated circuits with 4, 8, and 10 niobium layers developed at MIT Lincoln Laboratory. The process utilizes 248 nm photolithography, anodization, high-density plasma etching, and chemical mechanical polishing (CMP) for planarization of SiO$_2$ interlayer dielectric. JJ electric properties and statistics such as on-"},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1408.5829","kind":"arxiv","version":2},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"},"aliases":[{"alias_kind":"arxiv","alias_value":"1408.5829","created_at":"2026-05-18T01:20:59.417551+00:00"},{"alias_kind":"arxiv_version","alias_value":"1408.5829v2","created_at":"2026-05-18T01:20:59.417551+00:00"},{"alias_kind":"doi","alias_value":"10.48550/arxiv.1408.5829","created_at":"2026-05-18T01:20:59.417551+00:00"},{"alias_kind":"pith_short_12","alias_value":"HSWIAO5SOREY","created_at":"2026-05-18T12:28:30.664211+00:00"},{"alias_kind":"pith_short_16","alias_value":"HSWIAO5SOREYL73J","created_at":"2026-05-18T12:28:30.664211+00:00"},{"alias_kind":"pith_short_8","alias_value":"HSWIAO5S","created_at":"2026-05-18T12:28:30.664211+00:00"}],"events":[],"event_summary":{},"paper_claims":[],"inbound_citations":{"count":0,"internal_anchor_count":0,"sample":[]},"formal_canon":{"evidence_count":0,"sample":[],"anchors":[]},"links":{"html":"https://pith.science/pith/HSWIAO5SOREYL73J4JA2KK6L3W","json":"https://pith.science/pith/HSWIAO5SOREYL73J4JA2KK6L3W.json","graph_json":"https://pith.science/api/pith-number/HSWIAO5SOREYL73J4JA2KK6L3W/graph.json","events_json":"https://pith.science/api/pith-number/HSWIAO5SOREYL73J4JA2KK6L3W/events.json","paper":"https://pith.science/paper/HSWIAO5S"},"agent_actions":{"view_html":"https://pith.science/pith/HSWIAO5SOREYL73J4JA2KK6L3W","download_json":"https://pith.science/pith/HSWIAO5SOREYL73J4JA2KK6L3W.json","view_paper":"https://pith.science/paper/HSWIAO5S","resolve_alias":"https://pith.science/api/pith-number/resolve?arxiv=1408.5829&json=true","fetch_graph":"https://pith.science/api/pith-number/HSWIAO5SOREYL73J4JA2KK6L3W/graph.json","fetch_events":"https://pith.science/api/pith-number/HSWIAO5SOREYL73J4JA2KK6L3W/events.json","actions":{"anchor_timestamp":"https://pith.science/pith/HSWIAO5SOREYL73J4JA2KK6L3W/action/timestamp_anchor","attest_storage":"https://pith.science/pith/HSWIAO5SOREYL73J4JA2KK6L3W/action/storage_attestation","attest_author":"https://pith.science/pith/HSWIAO5SOREYL73J4JA2KK6L3W/action/author_attestation","sign_citation":"https://pith.science/pith/HSWIAO5SOREYL73J4JA2KK6L3W/action/citation_signature","submit_replication":"https://pith.science/pith/HSWIAO5SOREYL73J4JA2KK6L3W/action/replication_record"}},"created_at":"2026-05-18T01:20:59.417551+00:00","updated_at":"2026-05-18T01:20:59.417551+00:00"}