{"bundle_type":"pith_open_graph_bundle","bundle_version":"1.0","pith_number":"pith:2018:VIETMWV53RHQF7FHR6HJGLEVU2","short_pith_number":"pith:VIETMWV5","canonical_record":{"source":{"id":"1810.13156","kind":"arxiv","version":1},"metadata":{"license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","primary_cat":"physics.app-ph","submitted_at":"2018-10-31T08:40:21Z","cross_cats_sorted":[],"title_canon_sha256":"6911acd707348a491f6f0f332554b17c136b1387a660b4c956ca122c50135dc2","abstract_canon_sha256":"092aa133fc26381bfed107087890b5038d8bc7997cad03a8bcd084b2f308e9af"},"schema_version":"1.0"},"canonical_sha256":"aa09365abddc4f02fca78f8e932c95a6aad954c107debdfc1d554a8f603b42a9","source":{"kind":"arxiv","id":"1810.13156","version":1},"source_aliases":[{"alias_kind":"arxiv","alias_value":"1810.13156","created_at":"2026-05-18T00:01:52Z"},{"alias_kind":"arxiv_version","alias_value":"1810.13156v1","created_at":"2026-05-18T00:01:52Z"},{"alias_kind":"doi","alias_value":"10.48550/arxiv.1810.13156","created_at":"2026-05-18T00:01:52Z"},{"alias_kind":"pith_short_12","alias_value":"VIETMWV53RHQ","created_at":"2026-05-18T12:32:59Z"},{"alias_kind":"pith_short_16","alias_value":"VIETMWV53RHQF7FH","created_at":"2026-05-18T12:32:59Z"},{"alias_kind":"pith_short_8","alias_value":"VIETMWV5","created_at":"2026-05-18T12:32:59Z"}],"events":[{"event_type":"record_created","subject_pith_number":"pith:2018:VIETMWV53RHQF7FHR6HJGLEVU2","target":"record","payload":{"canonical_record":{"source":{"id":"1810.13156","kind":"arxiv","version":1},"metadata":{"license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","primary_cat":"physics.app-ph","submitted_at":"2018-10-31T08:40:21Z","cross_cats_sorted":[],"title_canon_sha256":"6911acd707348a491f6f0f332554b17c136b1387a660b4c956ca122c50135dc2","abstract_canon_sha256":"092aa133fc26381bfed107087890b5038d8bc7997cad03a8bcd084b2f308e9af"},"schema_version":"1.0"},"canonical_sha256":"aa09365abddc4f02fca78f8e932c95a6aad954c107debdfc1d554a8f603b42a9","receipt":{"kind":"pith_receipt","key_id":"pith-v1-2026-05","algorithm":"ed25519","signed_at":"2026-05-18T00:01:52.141851Z","signature_b64":"nydpnBGn+xjU6P3Jpyrn2SY56599XjuFz9aFhoPrRFhT/MVytahTTtAO208BsocJQqgy8p3s3xfC+3TYDDd6Aw==","signed_message":"canonical_sha256_bytes","builder_version":"pith-number-builder-2026-05-17-v1","receipt_version":"0.3","canonical_sha256":"aa09365abddc4f02fca78f8e932c95a6aad954c107debdfc1d554a8f603b42a9","last_reissued_at":"2026-05-18T00:01:52.141311Z","signature_status":"signed_v1","first_computed_at":"2026-05-18T00:01:52.141311Z","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54"},"source_kind":"arxiv","source_id":"1810.13156","source_version":1,"attestation_state":"computed"},"signer":{"signer_id":"pith.science","signer_type":"pith_registry","key_id":"pith-v1-2026-05","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54"},"created_at":"2026-05-18T00:01:52Z","supersedes":[],"prev_event":null,"signature":{"signature_status":"signed_v1","algorithm":"ed25519","key_id":"pith-v1-2026-05","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54","signature_b64":"Vy7XGABvN8YFrPlTHYk7AFGJQnboEGchdEj7TxRxKblkYbqeHmZKtax00UjoM+5OAYMXktIbgJHRPB5n6v9qDg==","signed_message":"open_graph_event_sha256_bytes","signed_at":"2026-06-08T03:24:04.689668Z"},"content_sha256":"59491deafa4bb934e8f35e0f4cfa017745540054e1b83e05d4e5b07fb7d9beac","schema_version":"1.0","event_id":"sha256:59491deafa4bb934e8f35e0f4cfa017745540054e1b83e05d4e5b07fb7d9beac"},{"event_type":"graph_snapshot","subject_pith_number":"pith:2018:VIETMWV53RHQF7FHR6HJGLEVU2","target":"graph","payload":{"graph_snapshot":{"paper":{"title":"High aspect ratio silicon structures by Displacement Talbot lithography and Bosch etching","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":[],"primary_cat":"physics.app-ph","authors_text":"Christian Dais, Harun Solak, Joan Vila-Comamala, Konstantins Jefimovs, Li Wang, Lucia Romano, Marco Stampanoni, Matias Kagias, Zhentian Wang","submitted_at":"2018-10-31T08:40:21Z","abstract_excerpt":"Despite the fact that the resolution of conventional contact/proximity lithography can reach feature sizes down to ~0.5-0.6 micrometers, the accurate control of the linewidth and uniformity becomes already very challenging for gratings with periods in the range of 1-2 {\\mu}m. This is particularly relevant for the exposure of large areas and wafers thinner than 300{\\mu}m. If the wafer or mask surface is not fully flat due to any kind of defects, such as bowing/warpage or remaining topography of the surface in case of overlay exposures, noticeable linewidth variations or complete failure of lith"},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1810.13156","kind":"arxiv","version":1},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"},"verdict_id":null},"signer":{"signer_id":"pith.science","signer_type":"pith_registry","key_id":"pith-v1-2026-05","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54"},"created_at":"2026-05-18T00:01:52Z","supersedes":[],"prev_event":null,"signature":{"signature_status":"signed_v1","algorithm":"ed25519","key_id":"pith-v1-2026-05","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54","signature_b64":"xuThU5OvqP/VuZkAD7mWMtqUitRrG00I/f1+9K3Dmpc6+8rGN+GJTrDT5hxDTmU6jMP8Sue9k4vSTZ45Ns1ZDQ==","signed_message":"open_graph_event_sha256_bytes","signed_at":"2026-06-08T03:24:04.690380Z"},"content_sha256":"6945104a381ac03172f255b6e6f55149e817613accc9fa01662bf19918f82c2d","schema_version":"1.0","event_id":"sha256:6945104a381ac03172f255b6e6f55149e817613accc9fa01662bf19918f82c2d"}],"timestamp_proofs":[],"mirror_hints":[{"mirror_type":"https","name":"Pith Resolver","base_url":"https://pith.science","bundle_url":"https://pith.science/pith/VIETMWV53RHQF7FHR6HJGLEVU2/bundle.json","state_url":"https://pith.science/pith/VIETMWV53RHQF7FHR6HJGLEVU2/state.json","well_known_bundle_url":"https://pith.science/.well-known/pith/VIETMWV53RHQF7FHR6HJGLEVU2/bundle.json","status":"primary"}],"public_keys":[{"key_id":"pith-v1-2026-05","algorithm":"ed25519","format":"raw","public_key_b64":"stVStoiQhXFxp4s2pdzPNoqVNBMojDU/fJ2db5S3CbM=","public_key_hex":"b2d552b68890857171a78b36a5dccf368a953413288c353f7c9d9d6f94b709b3","fingerprint_sha256_b32_first128bits":"RVFV5Z2OI2J3ZUO7ERDEBCYNKS","fingerprint_sha256_hex":"8d4b5ee74e4693bcd1df2446408b0d54","rotates_at":null,"url":"https://pith.science/pith-signing-key.json","notes":"Pith uses this Ed25519 key to sign canonical record SHA-256 digests. Verify with: ed25519_verify(public_key, message=canonical_sha256_bytes, signature=base64decode(signature_b64))."}],"merge_version":"pith-open-graph-merge-v1","built_at":"2026-06-08T03:24:04Z","links":{"resolver":"https://pith.science/pith/VIETMWV53RHQF7FHR6HJGLEVU2","bundle":"https://pith.science/pith/VIETMWV53RHQF7FHR6HJGLEVU2/bundle.json","state":"https://pith.science/pith/VIETMWV53RHQF7FHR6HJGLEVU2/state.json","well_known_bundle":"https://pith.science/.well-known/pith/VIETMWV53RHQF7FHR6HJGLEVU2/bundle.json"},"state":{"state_type":"pith_open_graph_state","state_version":"1.0","pith_number":"pith:2018:VIETMWV53RHQF7FHR6HJGLEVU2","merge_version":"pith-open-graph-merge-v1","event_count":2,"valid_event_count":2,"invalid_event_count":0,"equivocation_count":0,"current":{"canonical_record":{"metadata":{"abstract_canon_sha256":"092aa133fc26381bfed107087890b5038d8bc7997cad03a8bcd084b2f308e9af","cross_cats_sorted":[],"license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","primary_cat":"physics.app-ph","submitted_at":"2018-10-31T08:40:21Z","title_canon_sha256":"6911acd707348a491f6f0f332554b17c136b1387a660b4c956ca122c50135dc2"},"schema_version":"1.0","source":{"id":"1810.13156","kind":"arxiv","version":1}},"source_aliases":[{"alias_kind":"arxiv","alias_value":"1810.13156","created_at":"2026-05-18T00:01:52Z"},{"alias_kind":"arxiv_version","alias_value":"1810.13156v1","created_at":"2026-05-18T00:01:52Z"},{"alias_kind":"doi","alias_value":"10.48550/arxiv.1810.13156","created_at":"2026-05-18T00:01:52Z"},{"alias_kind":"pith_short_12","alias_value":"VIETMWV53RHQ","created_at":"2026-05-18T12:32:59Z"},{"alias_kind":"pith_short_16","alias_value":"VIETMWV53RHQF7FH","created_at":"2026-05-18T12:32:59Z"},{"alias_kind":"pith_short_8","alias_value":"VIETMWV5","created_at":"2026-05-18T12:32:59Z"}],"graph_snapshots":[{"event_id":"sha256:6945104a381ac03172f255b6e6f55149e817613accc9fa01662bf19918f82c2d","target":"graph","created_at":"2026-05-18T00:01:52Z","signer":{"key_id":"pith-v1-2026-05","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54","signer_id":"pith.science","signer_type":"pith_registry"},"payload":{"graph_snapshot":{"author_claims":{"count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","strong_count":0},"builder_version":"pith-number-builder-2026-05-17-v1","claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"paper":{"abstract_excerpt":"Despite the fact that the resolution of conventional contact/proximity lithography can reach feature sizes down to ~0.5-0.6 micrometers, the accurate control of the linewidth and uniformity becomes already very challenging for gratings with periods in the range of 1-2 {\\mu}m. This is particularly relevant for the exposure of large areas and wafers thinner than 300{\\mu}m. If the wafer or mask surface is not fully flat due to any kind of defects, such as bowing/warpage or remaining topography of the surface in case of overlay exposures, noticeable linewidth variations or complete failure of lith","authors_text":"Christian Dais, Harun Solak, Joan Vila-Comamala, Konstantins Jefimovs, Li Wang, Lucia Romano, Marco Stampanoni, Matias Kagias, Zhentian Wang","cross_cats":[],"headline":"","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","primary_cat":"physics.app-ph","submitted_at":"2018-10-31T08:40:21Z","title":"High aspect ratio silicon structures by Displacement Talbot lithography and Bosch etching"},"references":{"count":0,"internal_anchors":0,"resolved_work":0,"sample":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1810.13156","kind":"arxiv","version":1},"verdict":{"created_at":null,"id":null,"model_set":{},"one_line_summary":"","pipeline_version":null,"pith_extraction_headline":"","strongest_claim":"","weakest_assumption":""}},"verdict_id":null}}],"author_attestations":[],"timestamp_anchors":[],"storage_attestations":[],"citation_signatures":[],"replication_records":[],"corrections":[],"mirror_hints":[],"record_created":{"event_id":"sha256:59491deafa4bb934e8f35e0f4cfa017745540054e1b83e05d4e5b07fb7d9beac","target":"record","created_at":"2026-05-18T00:01:52Z","signer":{"key_id":"pith-v1-2026-05","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54","signer_id":"pith.science","signer_type":"pith_registry"},"payload":{"attestation_state":"computed","canonical_record":{"metadata":{"abstract_canon_sha256":"092aa133fc26381bfed107087890b5038d8bc7997cad03a8bcd084b2f308e9af","cross_cats_sorted":[],"license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","primary_cat":"physics.app-ph","submitted_at":"2018-10-31T08:40:21Z","title_canon_sha256":"6911acd707348a491f6f0f332554b17c136b1387a660b4c956ca122c50135dc2"},"schema_version":"1.0","source":{"id":"1810.13156","kind":"arxiv","version":1}},"canonical_sha256":"aa09365abddc4f02fca78f8e932c95a6aad954c107debdfc1d554a8f603b42a9","receipt":{"algorithm":"ed25519","builder_version":"pith-number-builder-2026-05-17-v1","canonical_sha256":"aa09365abddc4f02fca78f8e932c95a6aad954c107debdfc1d554a8f603b42a9","first_computed_at":"2026-05-18T00:01:52.141311Z","key_id":"pith-v1-2026-05","kind":"pith_receipt","last_reissued_at":"2026-05-18T00:01:52.141311Z","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54","receipt_version":"0.3","signature_b64":"nydpnBGn+xjU6P3Jpyrn2SY56599XjuFz9aFhoPrRFhT/MVytahTTtAO208BsocJQqgy8p3s3xfC+3TYDDd6Aw==","signature_status":"signed_v1","signed_at":"2026-05-18T00:01:52.141851Z","signed_message":"canonical_sha256_bytes"},"source_id":"1810.13156","source_kind":"arxiv","source_version":1}}},"equivocations":[],"invalid_events":[],"applied_event_ids":["sha256:59491deafa4bb934e8f35e0f4cfa017745540054e1b83e05d4e5b07fb7d9beac","sha256:6945104a381ac03172f255b6e6f55149e817613accc9fa01662bf19918f82c2d"],"state_sha256":"70aff6347a5c37ddedb84f9ffb0598462c0c31a53086d2446872d6a300f0a9e3"},"bundle_signature":{"signature_status":"signed_v1","algorithm":"ed25519","key_id":"pith-v1-2026-05","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54","signature_b64":"DuYe2TuQfZZ7QZSQcGhClEl79HTOWCoZE8q85V7l57my8UrJ8renBEn1qwaMEBd8SGWhKxopx7xSPiokCpv7Bg==","signed_message":"bundle_sha256_bytes","signed_at":"2026-06-08T03:24:04.693862Z","bundle_sha256":"1a5a25720e5765195b9ecbeb937af7977ab0e4e3fae67bc9fcbf2a155845c65d"}}