{"bundle_type":"pith_open_graph_bundle","bundle_version":"1.0","pith_number":"pith:2017:VV3CG4JHZKF3C4NPS45DFP5MRU","short_pith_number":"pith:VV3CG4JH","canonical_record":{"source":{"id":"1706.07590","kind":"arxiv","version":1},"metadata":{"license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","primary_cat":"physics.app-ph","submitted_at":"2017-06-23T08:03:23Z","cross_cats_sorted":["cond-mat.mtrl-sci"],"title_canon_sha256":"23529b6b8eafc25e2f7f90d440f1f054cbb21303e829d7f3d541a3e4cd7187aa","abstract_canon_sha256":"7be1a0eb041ccb9e126a05e0a6e5209238f096d434924be6ee9b9f518c359377"},"schema_version":"1.0"},"canonical_sha256":"ad76237127ca8bb171af973a32bfac8d2ad26ce813244c7c1f0c7cb593e49693","source":{"kind":"arxiv","id":"1706.07590","version":1},"source_aliases":[{"alias_kind":"arxiv","alias_value":"1706.07590","created_at":"2026-05-18T00:41:48Z"},{"alias_kind":"arxiv_version","alias_value":"1706.07590v1","created_at":"2026-05-18T00:41:48Z"},{"alias_kind":"doi","alias_value":"10.48550/arxiv.1706.07590","created_at":"2026-05-18T00:41:48Z"},{"alias_kind":"pith_short_12","alias_value":"VV3CG4JHZKF3","created_at":"2026-05-18T12:31:49Z"},{"alias_kind":"pith_short_16","alias_value":"VV3CG4JHZKF3C4NP","created_at":"2026-05-18T12:31:49Z"},{"alias_kind":"pith_short_8","alias_value":"VV3CG4JH","created_at":"2026-05-18T12:31:49Z"}],"events":[{"event_type":"record_created","subject_pith_number":"pith:2017:VV3CG4JHZKF3C4NPS45DFP5MRU","target":"record","payload":{"canonical_record":{"source":{"id":"1706.07590","kind":"arxiv","version":1},"metadata":{"license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","primary_cat":"physics.app-ph","submitted_at":"2017-06-23T08:03:23Z","cross_cats_sorted":["cond-mat.mtrl-sci"],"title_canon_sha256":"23529b6b8eafc25e2f7f90d440f1f054cbb21303e829d7f3d541a3e4cd7187aa","abstract_canon_sha256":"7be1a0eb041ccb9e126a05e0a6e5209238f096d434924be6ee9b9f518c359377"},"schema_version":"1.0"},"canonical_sha256":"ad76237127ca8bb171af973a32bfac8d2ad26ce813244c7c1f0c7cb593e49693","receipt":{"kind":"pith_receipt","key_id":"pith-v1-2026-05","algorithm":"ed25519","signed_at":"2026-05-18T00:41:48.701042Z","signature_b64":"6i+yM0+KAlHPituOxqHcqSUWjl9+3L79BlYnHzgj8tF35izrMEJ/wlF8rVxwTGcGwor7siUKkmyo2KE0jeERBw==","signed_message":"canonical_sha256_bytes","builder_version":"pith-number-builder-2026-05-17-v1","receipt_version":"0.3","canonical_sha256":"ad76237127ca8bb171af973a32bfac8d2ad26ce813244c7c1f0c7cb593e49693","last_reissued_at":"2026-05-18T00:41:48.700298Z","signature_status":"signed_v1","first_computed_at":"2026-05-18T00:41:48.700298Z","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54"},"source_kind":"arxiv","source_id":"1706.07590","source_version":1,"attestation_state":"computed"},"signer":{"signer_id":"pith.science","signer_type":"pith_registry","key_id":"pith-v1-2026-05","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54"},"created_at":"2026-05-18T00:41:48Z","supersedes":[],"prev_event":null,"signature":{"signature_status":"signed_v1","algorithm":"ed25519","key_id":"pith-v1-2026-05","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54","signature_b64":"ED3SfsJ5pWI7D4Gt1ZhrMIW6AogLGMwEYewZh3kiZhk14QF0bRNiavrl3iYsSvouxooO90pLhxP2lCcobWpCBQ==","signed_message":"open_graph_event_sha256_bytes","signed_at":"2026-06-08T07:58:18.206888Z"},"content_sha256":"fbf0303d26a5c46a6a977accfc233ccfda768ddaff23754e4cdc01cdf38242af","schema_version":"1.0","event_id":"sha256:fbf0303d26a5c46a6a977accfc233ccfda768ddaff23754e4cdc01cdf38242af"},{"event_type":"graph_snapshot","subject_pith_number":"pith:2017:VV3CG4JHZKF3C4NPS45DFP5MRU","target":"graph","payload":{"graph_snapshot":{"paper":{"title":"Effect of Isopropanol on Gold Assisted Chemical Etching of Silicon Microstructures","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":["cond-mat.mtrl-sci"],"primary_cat":"physics.app-ph","authors_text":"Joan Vila-Comamalab, Konstantins Jefimovs, Lucia Romano, Marco Stampanoni","submitted_at":"2017-06-23T08:03:23Z","abstract_excerpt":"Wet etching is an essential and complex step in semiconductor device processing. Metal-Assisted Chemical Etching (MacEtch) is fundamentally a wet but anisotropic etching method. In the MacEtch technique, there are still a number of unresolved challenges preventing the optimal fabrication of high-aspect-ratio semiconductor micro- and nanostructures, such as undesired etching, uncontrolled catalyst movement, non-uniformity and micro-porosity in the metal-free areas. Here, an optimized MacEtch process using with a nanostructured Au catalyst is proposed for fabrication of Si high aspect ratio micr"},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1706.07590","kind":"arxiv","version":1},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"},"verdict_id":null},"signer":{"signer_id":"pith.science","signer_type":"pith_registry","key_id":"pith-v1-2026-05","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54"},"created_at":"2026-05-18T00:41:48Z","supersedes":[],"prev_event":null,"signature":{"signature_status":"signed_v1","algorithm":"ed25519","key_id":"pith-v1-2026-05","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54","signature_b64":"4T/1CeMquV/iSdWxN8WaQU+Dl6iYTeQXfTz3IOIVJMe03D1elWKzKp4iVLvG7O1evvc3Ln2OZcL/eaAGVillCA==","signed_message":"open_graph_event_sha256_bytes","signed_at":"2026-06-08T07:58:18.207557Z"},"content_sha256":"5760f690c654bae6c3ded1e3d2596330197b29a4ce35182c2084183e1df45c8d","schema_version":"1.0","event_id":"sha256:5760f690c654bae6c3ded1e3d2596330197b29a4ce35182c2084183e1df45c8d"}],"timestamp_proofs":[],"mirror_hints":[{"mirror_type":"https","name":"Pith Resolver","base_url":"https://pith.science","bundle_url":"https://pith.science/pith/VV3CG4JHZKF3C4NPS45DFP5MRU/bundle.json","state_url":"https://pith.science/pith/VV3CG4JHZKF3C4NPS45DFP5MRU/state.json","well_known_bundle_url":"https://pith.science/.well-known/pith/VV3CG4JHZKF3C4NPS45DFP5MRU/bundle.json","status":"primary"}],"public_keys":[{"key_id":"pith-v1-2026-05","algorithm":"ed25519","format":"raw","public_key_b64":"stVStoiQhXFxp4s2pdzPNoqVNBMojDU/fJ2db5S3CbM=","public_key_hex":"b2d552b68890857171a78b36a5dccf368a953413288c353f7c9d9d6f94b709b3","fingerprint_sha256_b32_first128bits":"RVFV5Z2OI2J3ZUO7ERDEBCYNKS","fingerprint_sha256_hex":"8d4b5ee74e4693bcd1df2446408b0d54","rotates_at":null,"url":"https://pith.science/pith-signing-key.json","notes":"Pith uses this Ed25519 key to sign canonical record SHA-256 digests. Verify with: ed25519_verify(public_key, message=canonical_sha256_bytes, signature=base64decode(signature_b64))."}],"merge_version":"pith-open-graph-merge-v1","built_at":"2026-06-08T07:58:18Z","links":{"resolver":"https://pith.science/pith/VV3CG4JHZKF3C4NPS45DFP5MRU","bundle":"https://pith.science/pith/VV3CG4JHZKF3C4NPS45DFP5MRU/bundle.json","state":"https://pith.science/pith/VV3CG4JHZKF3C4NPS45DFP5MRU/state.json","well_known_bundle":"https://pith.science/.well-known/pith/VV3CG4JHZKF3C4NPS45DFP5MRU/bundle.json"},"state":{"state_type":"pith_open_graph_state","state_version":"1.0","pith_number":"pith:2017:VV3CG4JHZKF3C4NPS45DFP5MRU","merge_version":"pith-open-graph-merge-v1","event_count":2,"valid_event_count":2,"invalid_event_count":0,"equivocation_count":0,"current":{"canonical_record":{"metadata":{"abstract_canon_sha256":"7be1a0eb041ccb9e126a05e0a6e5209238f096d434924be6ee9b9f518c359377","cross_cats_sorted":["cond-mat.mtrl-sci"],"license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","primary_cat":"physics.app-ph","submitted_at":"2017-06-23T08:03:23Z","title_canon_sha256":"23529b6b8eafc25e2f7f90d440f1f054cbb21303e829d7f3d541a3e4cd7187aa"},"schema_version":"1.0","source":{"id":"1706.07590","kind":"arxiv","version":1}},"source_aliases":[{"alias_kind":"arxiv","alias_value":"1706.07590","created_at":"2026-05-18T00:41:48Z"},{"alias_kind":"arxiv_version","alias_value":"1706.07590v1","created_at":"2026-05-18T00:41:48Z"},{"alias_kind":"doi","alias_value":"10.48550/arxiv.1706.07590","created_at":"2026-05-18T00:41:48Z"},{"alias_kind":"pith_short_12","alias_value":"VV3CG4JHZKF3","created_at":"2026-05-18T12:31:49Z"},{"alias_kind":"pith_short_16","alias_value":"VV3CG4JHZKF3C4NP","created_at":"2026-05-18T12:31:49Z"},{"alias_kind":"pith_short_8","alias_value":"VV3CG4JH","created_at":"2026-05-18T12:31:49Z"}],"graph_snapshots":[{"event_id":"sha256:5760f690c654bae6c3ded1e3d2596330197b29a4ce35182c2084183e1df45c8d","target":"graph","created_at":"2026-05-18T00:41:48Z","signer":{"key_id":"pith-v1-2026-05","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54","signer_id":"pith.science","signer_type":"pith_registry"},"payload":{"graph_snapshot":{"author_claims":{"count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","strong_count":0},"builder_version":"pith-number-builder-2026-05-17-v1","claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"paper":{"abstract_excerpt":"Wet etching is an essential and complex step in semiconductor device processing. Metal-Assisted Chemical Etching (MacEtch) is fundamentally a wet but anisotropic etching method. In the MacEtch technique, there are still a number of unresolved challenges preventing the optimal fabrication of high-aspect-ratio semiconductor micro- and nanostructures, such as undesired etching, uncontrolled catalyst movement, non-uniformity and micro-porosity in the metal-free areas. Here, an optimized MacEtch process using with a nanostructured Au catalyst is proposed for fabrication of Si high aspect ratio micr","authors_text":"Joan Vila-Comamalab, Konstantins Jefimovs, Lucia Romano, Marco Stampanoni","cross_cats":["cond-mat.mtrl-sci"],"headline":"","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","primary_cat":"physics.app-ph","submitted_at":"2017-06-23T08:03:23Z","title":"Effect of Isopropanol on Gold Assisted Chemical Etching of Silicon Microstructures"},"references":{"count":0,"internal_anchors":0,"resolved_work":0,"sample":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1706.07590","kind":"arxiv","version":1},"verdict":{"created_at":null,"id":null,"model_set":{},"one_line_summary":"","pipeline_version":null,"pith_extraction_headline":"","strongest_claim":"","weakest_assumption":""}},"verdict_id":null}}],"author_attestations":[],"timestamp_anchors":[],"storage_attestations":[],"citation_signatures":[],"replication_records":[],"corrections":[],"mirror_hints":[],"record_created":{"event_id":"sha256:fbf0303d26a5c46a6a977accfc233ccfda768ddaff23754e4cdc01cdf38242af","target":"record","created_at":"2026-05-18T00:41:48Z","signer":{"key_id":"pith-v1-2026-05","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54","signer_id":"pith.science","signer_type":"pith_registry"},"payload":{"attestation_state":"computed","canonical_record":{"metadata":{"abstract_canon_sha256":"7be1a0eb041ccb9e126a05e0a6e5209238f096d434924be6ee9b9f518c359377","cross_cats_sorted":["cond-mat.mtrl-sci"],"license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","primary_cat":"physics.app-ph","submitted_at":"2017-06-23T08:03:23Z","title_canon_sha256":"23529b6b8eafc25e2f7f90d440f1f054cbb21303e829d7f3d541a3e4cd7187aa"},"schema_version":"1.0","source":{"id":"1706.07590","kind":"arxiv","version":1}},"canonical_sha256":"ad76237127ca8bb171af973a32bfac8d2ad26ce813244c7c1f0c7cb593e49693","receipt":{"algorithm":"ed25519","builder_version":"pith-number-builder-2026-05-17-v1","canonical_sha256":"ad76237127ca8bb171af973a32bfac8d2ad26ce813244c7c1f0c7cb593e49693","first_computed_at":"2026-05-18T00:41:48.700298Z","key_id":"pith-v1-2026-05","kind":"pith_receipt","last_reissued_at":"2026-05-18T00:41:48.700298Z","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54","receipt_version":"0.3","signature_b64":"6i+yM0+KAlHPituOxqHcqSUWjl9+3L79BlYnHzgj8tF35izrMEJ/wlF8rVxwTGcGwor7siUKkmyo2KE0jeERBw==","signature_status":"signed_v1","signed_at":"2026-05-18T00:41:48.701042Z","signed_message":"canonical_sha256_bytes"},"source_id":"1706.07590","source_kind":"arxiv","source_version":1}}},"equivocations":[],"invalid_events":[],"applied_event_ids":["sha256:fbf0303d26a5c46a6a977accfc233ccfda768ddaff23754e4cdc01cdf38242af","sha256:5760f690c654bae6c3ded1e3d2596330197b29a4ce35182c2084183e1df45c8d"],"state_sha256":"575ab241cc1c669d7d31592b62dc87849a51e3df11d5aa11b9de2cff9f7f42fc"},"bundle_signature":{"signature_status":"signed_v1","algorithm":"ed25519","key_id":"pith-v1-2026-05","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54","signature_b64":"aSFJmAtfu4FN8EZ2XThu/LKH+FskY0dY9nzZvyuibbRSljv6/EAtCbH/AqkMchQeJlgMbVkpUgAV4E0fDMkJBw==","signed_message":"bundle_sha256_bytes","signed_at":"2026-06-08T07:58:18.211886Z","bundle_sha256":"5412e6c950dc9de75b5606add252d020073845c50605be4428a12afa70547cca"}}