{"record_type":"pith_number_record","schema_url":"https://pith.science/schemas/pith-number/v1.json","pith_number":"pith:2014:YUHC2INMAHHSI4C7O3RJLTIY7P","short_pith_number":"pith:YUHC2INM","schema_version":"1.0","canonical_sha256":"c50e2d21ac01cf24705f76e295cd18fbccb61b8051b1a474e941dbf577e3a5f8","source":{"kind":"arxiv","id":"1402.2904","version":1},"attestation_state":"computed","paper":{"title":"EPIC: Efficient prediction of IC manufacturing hotspots with a unified meta-classification formulation","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":[],"primary_cat":"cs.AR","authors_text":"Bei Yu, David Z. Pan, Duo Ding, Joydeep Ghosh","submitted_at":"2014-02-12T17:25:05Z","abstract_excerpt":"In this paper we present EPIC, an efficient and effective predictor for IC manufacturing hotspots in deep sub-wavelength lithography. EPIC proposes a unified framework to combine different hotspot detection methods together, such as machine learning and pattern matching, using mathematical programming/optimization. EPIC algorithm has been tested on a number of industry benchmarks under advanced manufacturing conditions. It demonstrates so far the best capability in selectively combining the desirable features of various hotspot detection methods (3.5-8.2% accuracy improvement) as well as signi"},"verification_status":{"content_addressed":true,"pith_receipt":true,"author_attested":false,"weak_author_claims":0,"strong_author_claims":0,"externally_anchored":false,"storage_verified":false,"citation_signatures":0,"replication_records":0,"graph_snapshot":true,"references_resolved":false,"formal_links_present":false},"canonical_record":{"source":{"id":"1402.2904","kind":"arxiv","version":1},"metadata":{"license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","primary_cat":"cs.AR","submitted_at":"2014-02-12T17:25:05Z","cross_cats_sorted":[],"title_canon_sha256":"4295e1776ffcc8567dfccba66134576a2e9cd1614558475e44070f41b83a3bfd","abstract_canon_sha256":"3a6fc6b379d10982fe69aa58b2236abd75aeaeecd267dbc0d374804160072a08"},"schema_version":"1.0"},"receipt":{"kind":"pith_receipt","key_id":"pith-v1-2026-05","algorithm":"ed25519","signed_at":"2026-05-18T02:59:16.965381Z","signature_b64":"bTBZzV1IDoIXD7gOmO0az5X9s/W3VFOnPZCthMFDNhRkN3zkaqYTQX+ecfNKJ+ytX1HAJ7S18EeeQ6O0NJIXBg==","signed_message":"canonical_sha256_bytes","builder_version":"pith-number-builder-2026-05-17-v1","receipt_version":"0.3","canonical_sha256":"c50e2d21ac01cf24705f76e295cd18fbccb61b8051b1a474e941dbf577e3a5f8","last_reissued_at":"2026-05-18T02:59:16.964814Z","signature_status":"signed_v1","first_computed_at":"2026-05-18T02:59:16.964814Z","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54"},"graph_snapshot":{"paper":{"title":"EPIC: Efficient prediction of IC manufacturing hotspots with a unified meta-classification formulation","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":[],"primary_cat":"cs.AR","authors_text":"Bei Yu, David Z. Pan, Duo Ding, Joydeep Ghosh","submitted_at":"2014-02-12T17:25:05Z","abstract_excerpt":"In this paper we present EPIC, an efficient and effective predictor for IC manufacturing hotspots in deep sub-wavelength lithography. EPIC proposes a unified framework to combine different hotspot detection methods together, such as machine learning and pattern matching, using mathematical programming/optimization. EPIC algorithm has been tested on a number of industry benchmarks under advanced manufacturing conditions. It demonstrates so far the best capability in selectively combining the desirable features of various hotspot detection methods (3.5-8.2% accuracy improvement) as well as signi"},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1402.2904","kind":"arxiv","version":1},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"},"aliases":[{"alias_kind":"arxiv","alias_value":"1402.2904","created_at":"2026-05-18T02:59:16.964883+00:00"},{"alias_kind":"arxiv_version","alias_value":"1402.2904v1","created_at":"2026-05-18T02:59:16.964883+00:00"},{"alias_kind":"doi","alias_value":"10.48550/arxiv.1402.2904","created_at":"2026-05-18T02:59:16.964883+00:00"},{"alias_kind":"pith_short_12","alias_value":"YUHC2INMAHHS","created_at":"2026-05-18T12:28:57.508820+00:00"},{"alias_kind":"pith_short_16","alias_value":"YUHC2INMAHHSI4C7","created_at":"2026-05-18T12:28:57.508820+00:00"},{"alias_kind":"pith_short_8","alias_value":"YUHC2INM","created_at":"2026-05-18T12:28:57.508820+00:00"}],"events":[],"event_summary":{},"paper_claims":[],"inbound_citations":{"count":0,"internal_anchor_count":0,"sample":[]},"formal_canon":{"evidence_count":0,"sample":[],"anchors":[]},"links":{"html":"https://pith.science/pith/YUHC2INMAHHSI4C7O3RJLTIY7P","json":"https://pith.science/pith/YUHC2INMAHHSI4C7O3RJLTIY7P.json","graph_json":"https://pith.science/api/pith-number/YUHC2INMAHHSI4C7O3RJLTIY7P/graph.json","events_json":"https://pith.science/api/pith-number/YUHC2INMAHHSI4C7O3RJLTIY7P/events.json","paper":"https://pith.science/paper/YUHC2INM"},"agent_actions":{"view_html":"https://pith.science/pith/YUHC2INMAHHSI4C7O3RJLTIY7P","download_json":"https://pith.science/pith/YUHC2INMAHHSI4C7O3RJLTIY7P.json","view_paper":"https://pith.science/paper/YUHC2INM","resolve_alias":"https://pith.science/api/pith-number/resolve?arxiv=1402.2904&json=true","fetch_graph":"https://pith.science/api/pith-number/YUHC2INMAHHSI4C7O3RJLTIY7P/graph.json","fetch_events":"https://pith.science/api/pith-number/YUHC2INMAHHSI4C7O3RJLTIY7P/events.json","actions":{"anchor_timestamp":"https://pith.science/pith/YUHC2INMAHHSI4C7O3RJLTIY7P/action/timestamp_anchor","attest_storage":"https://pith.science/pith/YUHC2INMAHHSI4C7O3RJLTIY7P/action/storage_attestation","attest_author":"https://pith.science/pith/YUHC2INMAHHSI4C7O3RJLTIY7P/action/author_attestation","sign_citation":"https://pith.science/pith/YUHC2INMAHHSI4C7O3RJLTIY7P/action/citation_signature","submit_replication":"https://pith.science/pith/YUHC2INMAHHSI4C7O3RJLTIY7P/action/replication_record"}},"created_at":"2026-05-18T02:59:16.964883+00:00","updated_at":"2026-05-18T02:59:16.964883+00:00"}