Masruroh

Identifiers

• name variant Masruroh 0.50 · backfill

Papers (1)

1. The effect of RF-DC plasma N2-H2 in the selective hardening process for micro-patterned AISI420 physics.app-ph · 2019 · author #3

Mentions

No mention provenance yet.

Frequent Coauthors

• Dionisius Johanes Djoko Herry Santjojo 1 shared papers
• Hengky Herdianto 1 shared papers