Woochool Jang

Identifiers

• name variant Woochool Jang 0.60 · backfill

Papers (1)

1. Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2 cond-mat.mtrl-sci · 2014 · author #2

Mentions

• 1408.1252 #2 · backfill · confidence 0.70 Woochool Jang

Frequent Coauthors

• Heeyoung Jeon 1 shared papers
• Hyeongtag Jeon 1 shared papers
• Hyunjung Kim 1 shared papers
• Jingyu Park 1 shared papers
• Jinho Kim 1 shared papers
• Junhan Yuh 1 shared papers