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Adrian Stein

Identifiers

  • name variant Adrian Stein 0.60 · backfill

Papers (1)

  1. Bimodal substrate biasing to control \gamma-Al2O3 deposition during reactive magnetron sputtering physics.plasm-ph · 2013 · author #3

Mentions

  • 1305.4805 #3 · backfill · confidence 0.70 Adrian Stein

Frequent Coauthors