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Mats Hagberg (CHALMERS)

Identifiers

  • name variant Mats Hagberg (CHALMERS) 0.60 · backfill

Papers (1)

  1. Anisotropic Vapor HF etching of silicon dioxide for Si microstructure release cond-mat.mtrl-sci · 2012 · author #5

Mentions

  • 1207.2402 #5 · backfill · confidence 0.70 Mats Hagberg (CHALMERS)

Frequent Coauthors