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David Z. Pan

Identifiers

  • name variant David Z. Pan 0.60 · backfill

Papers (22)

  1. General-Purpose Photonic Computing Primitive for Contemporary Artificial Intelligence physics.optics · 2026 · author #5
  2. Harnessing Photonics for Machine Intelligence physics.optics · 2026 · author #7
  3. Report for NSF Workshop on AI for Electronic Design Automation cs.LG · 2026 · author #7
  4. Fine-Tuning Masked Diffusion for Provable Self-Correction cs.LG · 2025 · author #4
  5. UniMoCo: Unified Modality Completion for Robust Multi-Modal Embeddings cs.CV · 2025 · author #5
  6. LIMCA: LLM for Automating Analog In-Memory Computing Architecture Design Exploration cs.AR · 2025 · author #6
  7. Data Efficient Lithography Modeling with Transfer Learning and Active Data Selection cs.LG · 2018 · author #7
  8. PrivyNet: A Flexible Framework for Privacy-Preserving Deep Neural Network Training cs.LG · 2017 · author #5
  9. E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System cs.OH · 2015 · author #4
  10. Triple Patterning Lithography (TPL) Layout Decomposition using End-Cutting (JM3 Special Session) cs.OH · 2014 · author #4
  11. Layout Decomposition for Quadruple Patterning Lithography and Beyond cs.DS · 2014 · author #2
  12. Lithography Hotspot Detection and Mitigation in Nanometer VLSI cs.AR · 2014 · author #3
  13. TRIAD: a triple patterning lithography aware detailed router cs.AR · 2014 · author #3
  14. EPIC: Efficient prediction of IC manufacturing hotspots with a unified meta-classification formulation cs.AR · 2014 · author #4
  15. GLOW: A global router for low-power thermal-reliable interconnect synthesis using photonic wavelength multiplexing cs.AR · 2014 · author #3
  16. A High-Performance Triple Patterning Layout Decomposer with Balanced Density cs.AR · 2014 · author #6
  17. Methodology for standard cell compliance and detailed placement for triple patterning lithography cs.AR · 2014 · author #4
  18. Layout decomposition for triple patterning lithography cs.AR · 2014 · author #5
  19. Self-Aligned Double Patterning Friendly Configuration for Standard Cell Library Considering Placement cs.AR · 2014 · author #4
  20. E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System cs.AR · 2014 · author #4
  21. Triple Patterning Lithography (TPL) Layout Decomposition using End-Cutting cs.AR · 2014 · author #3
  22. L-Shape based Layout Fracturing for E-Beam Lithography cs.AR · 2014 · author #3

Mentions

  • 2503.13301 #6 · arxiv_oai · confidence 0.70 David Z. Pan
  • 1408.0407 #4 · backfill · confidence 0.70 David Z. Pan
  • 1404.0321 #2 · backfill · confidence 0.70 David Z. Pan
  • 1402.3150 #3 · backfill · confidence 0.70 David Z. Pan
  • 1402.2906 #3 · backfill · confidence 0.70 David Z. Pan
  • 1402.2904 #4 · backfill · confidence 0.70 David Z. Pan
  • 1402.2899 #3 · backfill · confidence 0.70 David Z. Pan
  • 1402.2890 #6 · backfill · confidence 0.70 David Z. Pan
  • 1402.2635 #4 · backfill · confidence 0.70 David Z. Pan
  • 1402.2459 #5 · backfill · confidence 0.70 David Z. Pan
  • 1402.2442 #4 · backfill · confidence 0.70 David Z. Pan
  • 1402.2435 #4 · backfill · confidence 0.70 David Z. Pan
  • 1402.2425 #3 · backfill · confidence 0.70 David Z. Pan
  • 1402.2420 #3 · backfill · confidence 0.70 David Z. Pan
  • 2510.01384 #4 · arxiv_oai · confidence 0.70 David Z. Pan
  • 2605.23051 #5 · arxiv_oai · confidence 0.70 David Z. Pan

Frequent Coauthors