AFM nano-oxidation lithography positions GaAs quantum dots in free-standing circular Bragg gratings with 51 nm radial accuracy, delivering 245-fold photoluminescence enhancement and polarization stability below 5%.
Nano-structure fabrication of GaAs using AFM tip-induced lo- cal oxidation method: Different doping types and plane orientations,
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Deterministic positioning of circular Bragg gratings using atomic force lithography for high-performance quantum dot light sources
AFM nano-oxidation lithography positions GaAs quantum dots in free-standing circular Bragg gratings with 51 nm radial accuracy, delivering 245-fold photoluminescence enhancement and polarization stability below 5%.