A bilayer electron-beam lithography process places sub-micron metal circuits on diamond anvil culets and facets, enabling mesoscopic electrical measurements inside diamond anvil cells.
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Sub-micron Circuit Fabrication on Diamond Anvils for Mesoscopic High-Pressure Experiments
A bilayer electron-beam lithography process places sub-micron metal circuits on diamond anvil culets and facets, enabling mesoscopic electrical measurements inside diamond anvil cells.