Reproduction of voltage-pressure dependence in DC magnetron sputtering using PIC and fluid models, explained by constant ionization rate requiring reduced electron energy at higher pressure.
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Pressure dependence of magnetron sputtering: 2D-RZ particle-in-cell and 1D fluid modeling
Reproduction of voltage-pressure dependence in DC magnetron sputtering using PIC and fluid models, explained by constant ionization rate requiring reduced electron energy at higher pressure.