Iterative differential deposition of WSi2 films corrected 300 mm silicon x-ray mirrors from several nm to as low as 0.1 nm RMS height error over 260 mm.
Development of a position-velocity-time-modulated two-dimensional ion beam figuring system for synchrotron x-ray mirror fabrication,
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X-ray mirror figure correction using differential deposition
Iterative differential deposition of WSi2 films corrected 300 mm silicon x-ray mirrors from several nm to as low as 0.1 nm RMS height error over 260 mm.