A tuned electron-beam lithography process with PMMA resist, thermal reflow and a sharp apex produces silicon blazed gratings with 0.39 nm facet roughness and measured efficiency close to simulation.
o ller , author M. Nagasono , author M. St\
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High-quality Blazed Gratings through Synergy between E-Beam lithography and Robust Characterisation Techniques
A tuned electron-beam lithography process with PMMA resist, thermal reflow and a sharp apex produces silicon blazed gratings with 0.39 nm facet roughness and measured efficiency close to simulation.