Visible pulsed laser annealing of 8-nm Hf0.5Zr0.5O2 films reaches 86% ferroelectric orthorhombic phase at a sharp threshold of 177 mJ/cm², with simulations indicating substrate melting caps temperature at 1900°C and supports a tetragonal-to-orthorhombic kinetic pathway.
Title resolution pending
1 Pith paper cite this work. Polarity classification is still indexing.
1
Pith paper citing it
fields
cond-mat.mtrl-sci 1years
2026 1verdicts
CONDITIONAL 1representative citing papers
citing papers explorer
-
Tracking visible pulsed laser annealing of Hf$_{0.5}$Zr$_{0.5}$O$_2$ heterostructures with in situ transmission electron microscopy
Visible pulsed laser annealing of 8-nm Hf0.5Zr0.5O2 films reaches 86% ferroelectric orthorhombic phase at a sharp threshold of 177 mJ/cm², with simulations indicating substrate melting caps temperature at 1900°C and supports a tetragonal-to-orthorhombic kinetic pathway.