Ion-beam-deposited silicon nitride, a CMOS-compatible low-temperature film, can be used to fabricate low-noise solid-state nanopores that detect single DNA molecules.
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A Method for Fabricating CMOS Back-End-of-Line-Compatible Solid-State Nanopore Devices
Ion-beam-deposited silicon nitride, a CMOS-compatible low-temperature film, can be used to fabricate low-noise solid-state nanopores that detect single DNA molecules.