An ADMM solver is developed for inverse lithography optimization that splits the problem into subproblems solved efficiently, including an analytical threshold truncation for the imaging function, with convergence analysis and numerical tests.
GAN-OPC: Mask optimization with lithography-guided generative adversarial nets
1 Pith paper cite this work. Polarity classification is still indexing.
1
Pith paper citing it
fields
math.NA 1years
2022 1verdicts
UNVERDICTED 1representative citing papers
citing papers explorer
-
An Alternating Direction Method of Multipliers for Inverse Lithography Problem
An ADMM solver is developed for inverse lithography optimization that splits the problem into subproblems solved efficiently, including an analytical threshold truncation for the imaging function, with convergence analysis and numerical tests.