A retrofitted magnetron sputtering chamber used Gaussian-process-guided experiments to semi-autonomously locate a 2.3 MV/cm coercive field in Al1-x-yScxByN thin films.
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An Automated Magnetron Sputtering Chamber for Ferroelectric Thin Film Deposition
A retrofitted magnetron sputtering chamber used Gaussian-process-guided experiments to semi-autonomously locate a 2.3 MV/cm coercive field in Al1-x-yScxByN thin films.