A refined photolithography method produces large-area, contamination-free diamond membranes down to 70 nm thick with sub-nanometer parallelism and atomic surface smoothness for quantum photonic nanostructures.
FOx-16 was then spin-coated, resulting in a mask thickness of approximately 1.25 µm
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Homogeneous Free-Standing Nanostructures from Bulk Diamond over Millimeter Scales for Quantum Technologies
A refined photolithography method produces large-area, contamination-free diamond membranes down to 70 nm thick with sub-nanometer parallelism and atomic surface smoothness for quantum photonic nanostructures.