Optimizing electron-beam lithography via smaller beam step size and avoiding main-field stitching reduces random and systematic frequency scatter four-fold in superconducting microstrip resonators.
Matt and Stacey, Gordon J
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Enhanced electron-beam lithography to reduce the frequency scatter of 200-400 GHz superconducting microstrip resonators for on-chip filterbank spectrometers
Optimizing electron-beam lithography via smaller beam step size and avoiding main-field stitching reduces random and systematic frequency scatter four-fold in superconducting microstrip resonators.