In 3D kinetic Monte Carlo simulations, the Si-percolation threshold of phase-separated SiOx moves from x≈1.35 in thick films to x≈0.85 in 1.4-nm films, with bulk behavior above ≈4.2 nm.
Sarikov, Thermodynamic theory of phase separation in nonstoichiometric Si oxide films induced by high-temperature anneals, Nanomanufacturing 3, 293 (2023)
1 Pith paper cite this work, alongside 8 external citations. Polarity classification is still indexing.
1
Pith paper citing it
8
external citations · OpenAlex
fields
cond-mat.mtrl-sci 1years
2025 1verdicts
CONDITIONAL 1representative citing papers
citing papers explorer
-
3D lattice Monte Carlo modeling of morphology formation of Si/SiOx nanocomposites during phase separation of nonstoichiometric Si oxide films
In 3D kinetic Monte Carlo simulations, the Si-percolation threshold of phase-separated SiOx moves from x≈1.35 in thick films to x≈0.85 in 1.4-nm films, with bulk behavior above ≈4.2 nm.