A waterless cAFM lithography method achieves nonvolatile reconfigurable control of nanoscale polaron-electron liquid transitions at the LaAlO3/SrTiO3 interface with 0.85 nm line resolution at mK temperatures.
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Reconfigurable Oxide Nanoelectronics by Tip-induced Electron Delocalization
A waterless cAFM lithography method achieves nonvolatile reconfigurable control of nanoscale polaron-electron liquid transitions at the LaAlO3/SrTiO3 interface with 0.85 nm line resolution at mK temperatures.