A physics-driven U-net++ that outputs masks as stacks of rectangular blocks shows lower mask-writing shot counts with modest pattern-error increase.
The vector lithography model The lithography model includes the imaging model and the photoresist threshold model
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Fast inverse lithography based on a model-driven block stacking convolutional neural network
A physics-driven U-net++ that outputs masks as stacks of rectangular blocks shows lower mask-writing shot counts with modest pattern-error increase.