A new margin-based loss, HEM, trains image classifiers that are more robust to unknown and adversarial inputs and better at continual learning and segmentation than cross-entropy-trained models.
Exploring Adversarial Robustness of Deep Metric Learning
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abstract
Deep Metric Learning (DML), a widely-used technique, involves learning a distance metric between pairs of samples. DML uses deep neural architectures to learn semantic embeddings of the input, where the distance between similar examples is small while dissimilar ones are far apart. Although the underlying neural networks produce good accuracy on naturally occurring samples, they are vulnerable to adversarially-perturbed samples that reduce performance. We take a first step towards training robust DML models and tackle the primary challenge of the metric losses being dependent on the samples in a mini-batch, unlike standard losses that only depend on the specific input-output pair. We analyze this dependence effect and contribute a robust optimization formulation. Using experiments on three commonly-used DML datasets, we demonstrate 5-76 fold increases in adversarial accuracy, and outperform an existing DML model that sought out to be robust.
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HEM: a margin-based loss for visual categorisation tasks
A new margin-based loss, HEM, trains image classifiers that are more robust to unknown and adversarial inputs and better at continual learning and segmentation than cross-entropy-trained models.