In 3D kinetic Monte Carlo simulations, the Si-percolation threshold of phase-separated SiOx moves from x≈1.35 in thick films to x≈0.85 in 1.4-nm films, with bulk behavior above ≈4.2 nm.
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3D lattice Monte Carlo modeling of morphology formation of Si/SiOx nanocomposites during phase separation of nonstoichiometric Si oxide films
In 3D kinetic Monte Carlo simulations, the Si-percolation threshold of phase-separated SiOx moves from x≈1.35 in thick films to x≈0.85 in 1.4-nm films, with bulk behavior above ≈4.2 nm.