A rigorous coupled-wave analysis predicts that broadband UV illumination produces better-resolved and more vertical columnar photoresist features in near-field phase-shifting contact lithography than monochromatic illumination, with linewidths below 100 nm.
Martin OJF, Piller NB: Light–coupling masks: An alternative, lensless approach to high–resolution optical contact lithography
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Electromagnetic modeling of near-field phase-shifting contact lithography with broadband ultraviolet illumination
A rigorous coupled-wave analysis predicts that broadband UV illumination produces better-resolved and more vertical columnar photoresist features in near-field phase-shifting contact lithography than monochromatic illumination, with linewidths below 100 nm.