A theoretical analysis claims plasma-surface coupling in thin-film deposition is asymptotically free, giving exponential grain-size scaling, pressure independence, and a crystal-symmetry faceting criterion.
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Scaling Relations, Morphological Stability, and Asymptotic Freedom of Plasma-Surface Deposition Dynamics
A theoretical analysis claims plasma-surface coupling in thin-film deposition is asymptotically free, giving exponential grain-size scaling, pressure independence, and a crystal-symmetry faceting criterion.