Unpatterned hyperdoped polysilicon films with nanometric grains exhibit tunable mid-IR localized surface plasmons arising from natural metal-dielectric interfaces at grain boundaries.
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Emergence of Localized Surface Plasmons in Unpatterned Hyperdoped Polycrystalline Silicon
Unpatterned hyperdoped polysilicon films with nanometric grains exhibit tunable mid-IR localized surface plasmons arising from natural metal-dielectric interfaces at grain boundaries.