Tantalum resonators on silicon with a niobium seed layer reach internal quality factors up to 3.6 million at high power and kinetic inductance up to 0.6 pH per square, with thinner films giving more inductance but lower quality.
Argon milling induced decoherence mechanisms in superconducting quantum circuits
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abstract
The fabrication of superconducting circuits requires multiple deposition, etch and cleaning steps, each possibly introducing material property changes and microscopic defects. In this work, we specifically investigate the process of argon milling, a potentially coherence limiting step, using niobium and aluminum superconducting resonators as a proxy for surface-limited behavior of qubits. We find that niobium microwave resonators exhibit an order of magnitude decrease in quality-factors after surface argon milling, while aluminum resonators are resilient to the same process. Extensive analysis of the niobium surface shows no change in the suboxide composition due to argon milling, while two-tone spectroscopy measurements reveal an increase in two-level system electrical dipole moments, indicating a structurally altered niobium oxide hosting larger two-level system defects. However, a short dry etch can fully recover the argon milling induced losses on niobium, offering a potential route towards state-of-the-art overlap Josephson junction qubits with niobium circuitry.
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quant-ph 1years
2024 1verdicts
CONDITIONAL 1representative citing papers
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Engineering high-Q superconducting tantalum microwave coplanar waveguide resonators for compact coherent quantum circuits
Tantalum resonators on silicon with a niobium seed layer reach internal quality factors up to 3.6 million at high power and kinetic inductance up to 0.6 pH per square, with thinner films giving more inductance but lower quality.