PTR attributes wafer defects to process steps by comparing model predictions on partial trajectories, using kernel-based process embeddings and a constrained RNN.
Recurrent feature-incorporated convolutional neural network for virtual metrology of the chemical mechanical pla- narization process,
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Wafer Defect Root Cause Analysis with Partial Trajectory Regression
PTR attributes wafer defects to process steps by comparing model predictions on partial trajectories, using kernel-based process embeddings and a constrained RNN.