Plasma etch recipe produces photonic-grade diamond-on-insulator films from bonded SCD membranes and enables 5 nm resolution thickness mapping via colorimetry on standard microscope images.
Title resolution pending
1 Pith paper cite this work. Polarity classification is still indexing.
1
Pith paper citing it
fields
physics.optics 1years
2026 1verdicts
UNVERDICTED 1representative citing papers
citing papers explorer
-
Plasma Etch Process Optimization for Photonic-Grade Diamond-on-Insulator Substrates and Thickness Evaluation using Colorimetry
Plasma etch recipe produces photonic-grade diamond-on-insulator films from bonded SCD membranes and enables 5 nm resolution thickness mapping via colorimetry on standard microscope images.