Potential Loss Analysis attributes wafer defects to individual process steps by fitting a monotone value function whose increments serve as non-negative attribution scores, replacing the zeroed-out counterfactuals of partial trajectory regression.
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Cross-Process Defect Attribution using Potential Loss Analysis
Potential Loss Analysis attributes wafer defects to individual process steps by fitting a monotone value function whose increments serve as non-negative attribution scores, replacing the zeroed-out counterfactuals of partial trajectory regression.